title: Temperature dependence of formation of a supported phospholipid bilayer from vesicles on SiO2.
abstract: Adsorption of egg-phosphatidylcholine vesicles and bilayer formation on a SiO2 surface was investigated in the temperature range 278-303 K using the quartz crystal microbalance-dissipation technique. The critical coverage for the vesicle-->bilayer transition is found to decrease with increasing temperature. The temperature dependence of the time-scale characterizing this transition can be represented in the Arrhenius form. Higher temperatures produce a bilayer with fewer trapped, nonruptured vesicles.
authors.affiliation: Department of Applied Physics, Chalmers University of Technology, Göteborg S-412 96, Sweden.
authors.forename: E
authors.initials: E
authors.lastname: Reimhult
authors.forename: F
authors.initials: F
authors.lastname: Höök
authors.forename: B
authors.initials: B
authors.lastname: Kasemo
mesh_terms: D055592:Biophysical Phenomena; D001703:Biophysics; D066298:In Vitro Techniques; D008051:Lipid Bilayers / Q000737:chemistry*; D010713:Phosphatidylcholines / Q000737:chemistry; D012822:Silicon Dioxide; D013816:Thermodynamics
chemical_list: D008051:Lipid Bilayers; D010713:Phosphatidylcholines; D012822:Silicon Dioxide