To-and-fro motion of W5Si3 on a beta-Si3N4 substrate at elevated temperatures.
Behavior of fine crystalline particles of W5Si3 on a beta-Si3N4 substrate at high temperatures was observed by an in situ heating experiment in a transmission electron microscope. Some of the fine particles of W5Si3 moved in a to-and-fro manner.
Arai
S
S
Center for Integrated Research in Science and Technology, Nagoya University, 464-8603, Japan.
Suzuki
K
K
Saka
H
H
D003460:Crystallization; D006358:Hot Temperature; D008854:Microscopy, Electron / Q000379:methods; D009038:Motion; D017655:Silicon Compounds
D017655:Silicon Compounds; C032734:silicon nitride