title: To-and-fro motion of W5Si3 on a beta-Si3N4 substrate at elevated temperatures.
abstract: Behavior of fine crystalline particles of W5Si3 on a beta-Si3N4 substrate at high temperatures was observed by an in situ heating experiment in a transmission electron microscope. Some of the fine particles of W5Si3 moved in a to-and-fro manner.
authors.affiliation: Center for Integrated Research in Science and Technology, Nagoya University, 464-8603, Japan.
authors.forename: S
authors.initials: S
authors.lastname: Arai
authors.forename: K
authors.initials: K
authors.lastname: Suzuki
authors.forename: H
authors.initials: H
authors.lastname: Saka
mesh_terms: D003460:Crystallization; D006358:Hot Temperature; D008854:Microscopy, Electron / Q000379:methods; D009038:Motion; D017655:Silicon Compounds
chemical_list: D017655:Silicon Compounds; C032734:silicon nitride