title: A high power density submicron electron beam source.
abstract: An electron-optical system (with a thermal field electron source-cathode) is introduced. The system is designed to form on the target surface submicron microprobes of a power density exceeding the ablation threshold ( approximately 10(8)W/cm(2)) of condensed media. The numerical modeling of electron paths carried out using a software package (TAU) developed by the authors has shown that the proposed electron-optical system is capable of forming microprobes of a power density comparable with that of modern high-power pulsed laser sources (up to approximately 10(11)W/cm(2)).
authors.affiliation: Institute for Analytical Instrumentation RAS, Rizhskij Prospect 26, Sankt-Petersburg 198103, Russia. ptitsin@iai.rssi.ru
authors.forename: V E
authors.initials: VE
authors.lastname: Ptitsin
authors.forename: V F
authors.initials: VF
authors.lastname: Tregubov