Optical diagnostics for thin film processing.
Optical diagnostics are used to probe the plasma or neutral gas above the substrate, particles in the gas or on the surface, the film surface and reactor walls, the film itself, and the substrate during thin film processing. The development and application of optical probes are highlighted, in particular for analyzing plasma/gas phase intermediates and products and film composition, and performing metrology, thermometry, and endpoint detection and control. Probing etching (particularly plasma etching) and deposition (particularly epitaxy) are emphasized.
Herman
Irving P
IP
Department of Applied Physics and Applied Mathematics, Columbia University, New York, NY 10027, USA. iph1@columbia.edu