title: Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography.
abstract: Scanning illumination systems provide for a powerful and flexible means for controlling illumination coherence properties. Here we present a scanning Fourier synthesis illuminator that enables microfield extreme ultraviolet lithography to be performed on an intrinsically coherent synchrotron undulator beamline. The effectiveness of the system is demonstrated through a variety of print experiments, including the use of resolution enhancing coherence functions that enable the printing of 50-nm line-space features by use of a lithographic optic with a numerical aperture of 0.1 and an operational wavelength of 13.4 nm.
authors.affiliation: Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.
authors.forename: Patrick P
authors.initials: PP
authors.lastname: Naulleau
authors.forename: Kenneth A
authors.initials: KA
authors.lastname: Goldberg
authors.forename: Phil
authors.initials: P
authors.lastname: Batson
authors.forename: Jeffrey
authors.initials: J
authors.lastname: Bokor
authors.forename: Paul
authors.initials: P
authors.lastname: Denham
authors.forename: Senajith
authors.initials: S
authors.lastname: Rekawa