Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography.
Scanning illumination systems provide for a powerful and flexible means for controlling illumination coherence properties. Here we present a scanning Fourier synthesis illuminator that enables microfield extreme ultraviolet lithography to be performed on an intrinsically coherent synchrotron undulator beamline. The effectiveness of the system is demonstrated through a variety of print experiments, including the use of resolution enhancing coherence functions that enable the printing of 50-nm line-space features by use of a lithographic optic with a numerical aperture of 0.1 and an operational wavelength of 13.4 nm.
Naulleau
Patrick P
PP
Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA.
Goldberg
Kenneth A
KA
Batson
Phil
P
Bokor
Jeffrey
J
Denham
Paul
P
Rekawa
Senajith
S