title: Diffusion-corrected simultaneous multilayer growth model.
abstract: A diffusion-corrected simultaneous multilayer (DCSM) model was developed, taking into account up-step and down-step diffusion of adatoms and enabling rapid identification of different film growth modes. This DCSM model was applied to the initial growth of Cr on (100) SrTiO3 and (0001) alpha-Al2O3 surfaces, monitoring the deposition process by in situ Auger electron spectroscopy. We conclude with general remarks on the usefulness of the DCSM model for exploiting solid state wetting processes of thin metal films on different substrates.
authors.affiliation: Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany.
authors.forename: Qiang
authors.initials: Q
authors.lastname: Fu
authors.forename: Thomas
authors.initials: T
authors.lastname: Wagner