title: Dissociative electron attachment to DNA.
abstract: Electron-stimulated desorption of anions from thin films of linear and supercoiled DNA is investigated in the range 3-20 eV. Resonant structures are observed with maxima at 9.4+/-0.3, 9.2+/-0.3, and 9.2+/-0.3 eV, respectively, in the yield dependence of H-, O-, and OH- on the incident electron energy. Their formation is attributed to dissociative electron attachment.
authors.affiliation: Group of the Canadian Institutes of Health Research in the Radiation Sciences, Faculté de médecine, Université de Sherbrooke, Sherbrooke (QC) Canada J1H 5N4.
authors.forename: X
authors.initials: X
authors.lastname: Pan
authors.forename: P
authors.initials: P
authors.lastname: Cloutier
authors.forename: D
authors.initials: D
authors.lastname: Hunting
authors.forename: L
authors.initials: L
authors.lastname: Sanche
mesh_terms: D000838:Anions / Q000737:chemistry; D004249:DNA Damage; D004278:DNA, Superhelical / Q000737:chemistry* / Q000528:radiation effects; D004583:Electrons
chemical_list: D000838:Anions; D004278:DNA, Superhelical