title: Separation of aliphatic carboxylic acids and benzenecarboxylic acids by ion-exclusion chromatography with various cation-exchange resin columns and sulfuric acid as eluent.
abstract: The application of various hydrophilic cation-exchange resins for high-performance liquid chromatography (sulfonated silica gel: TSKgel SP-2SW, carboxylated silica gel: TSKgel CM-2SW, sulfonated polymethacrylate resin: TSKgel SP-5PW, carboxylated polymethacrylate resins: TSKgel CM-5PW and TSKgel OA-Pak A) as stationary phases in ion-exclusion chromatography for C1-C7 aliphatic carboxylic acids (formic, acetic, propionic, butyric, isovaleric, valeric, isocaproic, caproic, 2-methylhexanoic and heptanoic acids) and benzenecarboxylic acids (pyromellitic, trimellitic, hemimellitic, o-phthalic, m-phthalic, p-phthalic, benzoic, salicylic acids and phenol) was carried out using diluted sulfuric acid as the eluent. Silica-based cation-exchange resins (TSKgel SP-2SW and TSKgel CM-2SW) were very suitable for the ion-exclusion chromatographic separation of these benzenecarboxylic acids. Excellent simultaneous separation of these benzenecarboxylic acids was achieved on a TSKgel SP-2SW column (150 x 6 mm I.D.) in 17 min using a 2.5 mM sulfuric acid at pH 2.4 as the eluent. Polymethacrylate-based cation-exchange resins (TSKgel SP-5PW, TSKgel CM-5PW and TSKgel OA-Pak A) acted as advanced stationary phases for the ion-exclusion chromatographic separation of these C1-C7 aliphatic carboxylic acids. Excellent simultaneous separation of these C1-C7 acids was achieved on a TSKgel CM-5PW column (150 x 6 mm I.D.) in 32 min using a 0.05 mM sulfuric acid at pH 4.0 as the eluent.
authors.affiliation: Ceramics Research Institute, National Institute of Advanced Industrial Science and Technology, 2266-98 Anagahora, Sinoshidami, Moriyama-ku, Nagoya 463-8560, Japan. kazu.ohta@aist.go.jp
authors.forename: Kazutoku
authors.initials: K
authors.lastname: Ohta
authors.forename: Masayoshi
authors.initials: M
authors.lastname: Ohashi
authors.forename: Ji-Ye
authors.initials: JY
authors.lastname: Jin
authors.forename: Toyohide
authors.initials: T
authors.lastname: Takeuchi
authors.forename: Chuzo
authors.initials: C
authors.lastname: Fujimoto
authors.forename: Seong-Ho
authors.initials: SH
authors.lastname: Choi
authors.forename: Jae-Jeong
authors.initials: JJ
authors.lastname: Ryoo
authors.forename: Kwang-Pill
authors.initials: KP
authors.lastname: Lee
mesh_terms: D001555:Benzene Derivatives / Q000302:isolation & purification*; D002264:Carboxylic Acids / Q000302:isolation & purification*; D002411:Cation Exchange Resins; D002852:Chromatography, Ion Exchange / Q000379:methods*; D007202:Indicators and Reagents; D011109:Polymethacrylic Acids; D058428:Silica Gel; D012822:Silicon Dioxide; D055672:Static Electricity; D013451:Sulfonic Acids; D013464:Sulfuric Acids
chemical_list: D001555:Benzene Derivatives; D002264:Carboxylic Acids; D002411:Cation Exchange Resins; D007202:Indicators and Reagents; D011109:Polymethacrylic Acids; D013451:Sulfonic Acids; D013464:Sulfuric Acids; C030613:polymethacrylic acid; D058428:Silica Gel; D012822:Silicon Dioxide; C033158:sulfuric acid