title: Reductive dechlorination of carbon tetrachloride and tetrachloroethylene by zerovalent silicon-iron reductants.
abstract: Reductive dechlorination of carbon tetrachloride (CT) and tetrachloroethylene (PCE) by zerovalent silicon (ZVS, Si0) and the combination of Si0 with metal iron (Fe0) was investigated as potential reductants for chlorinated hydrocarbons. The X-ray photoelectron spectroscopy (XPS) was used to identify the surface characteristics of Si0. CT and PCE can be completely degraded via sequential reductive dechlorination to form lesser chlorinated homologues by Si0. Productions of chloroform (CF) and trichloroethylene (TCE) accounted for 80% of CT and 65% of PCE dechlorination, respectively. The degradation of CT and PCE by Si0 at pH 8.3 followed pseudo-first-order kinetics, and the normalized surface rate constants (k(sa)) were 0.288 and 0.003 L m(-2) h(-1), respectively, which react more efficiently than zerovalent iron in CT and PCE dechlorination. A linear relationship was also established between pH and the k(sa) value. The XPS results showed that the hydrogenated silicon surface and silicon oxides on the silicon surface were removed during the dechlorination processes, thus providing a relatively clean silicon surface for dechlorination reactions. The combination of zerovalent silicon with iron influences both the dechlorination rate and the distribution of products. Sequential reductive dechlorination was still the main reaction for CT dechlorination by Si0/Fe0, while reductive dechlorination and beta-elimination were the dominant reaction pathways for PCE dechlorination with ethane and ethene as the major end products. Also, the combination of silicon and iron constitutes a buffer system to maintain the pH at a stable value. A 0.3 unit of pH changed upon increasing the amount of Fe by a factor of 35 was observed, depicting that Si0 serves as a pH buffer in Si0/Fe0 system during dechlorination processes.
authors.affiliation: Department of Atomic Science, National Tsing Hua University, Hsinchu 30013, Taiwan. radoong@mx.nthu.edu.tw
authors.forename: Ruey-An
authors.initials: RA
authors.lastname: Doong
authors.forename: Kun-Tien
authors.initials: KT
authors.lastname: Chen
authors.forename: Hsiao-Chung
authors.initials: HC
authors.lastname: Tsai
mesh_terms: D002251:Carbon Tetrachloride / Q000737:chemistry*; D006863:Hydrogen-Ion Concentration; D007501:Iron / Q000737:chemistry*; D010084:Oxidation-Reduction; D012825:Silicon / Q000737:chemistry*; D012997:Solvents / Q000737:chemistry*; D013750:Tetrachloroethylene / Q000737:chemistry*; D018508:Water Purification / Q000379:methods*
chemical_list: D012997:Solvents; D002251:Carbon Tetrachloride; D007501:Iron; D013750:Tetrachloroethylene; D012825:Silicon