title: Oxide/metal interface distance and epitaxial strain in the NiO/Ag(001) system.
abstract: Geometric parameters of NiO films epitaxially grown on Ag(001) were determined using two independent experimental techniques and ab initio simulations. Primary beam diffraction modulated electron emission experiments determined that the NiO films grow with O on top of Ag and that the oxide/metal interface distance is d=2.3+/-0.1 A. Polarization-dependent x-ray absorption, at the Ni-K edge, determined the tetragonal strain (r( parallel )=2.046+/-0.009 A, r( perpendicular )=2.12+/-0.02 A) and d=2.37+/-0.05 A. Periodic slab model results agree with the experiments (d=2.40, r( parallel )=2.07, r( perpendicular )=2.10 A; the O-on-top configuration is the most stable).
authors.affiliation: Department of Inorganic, Physical and Materials Chemistry, University of Torino, Via P. Giuria 7, I-10125 Torino, Italy. carlo.lamberti@unito.it
authors.forename: Carlo
authors.initials: C
authors.lastname: Lamberti
authors.forename: Elena
authors.initials: E
authors.lastname: Groppo
authors.forename: Carmelo
authors.initials: C
authors.lastname: Prestipino
authors.forename: Silvia
authors.initials: S
authors.lastname: Casassa
authors.forename: Anna Maria
authors.initials: AM
authors.lastname: Ferrari
authors.forename: Cesare
authors.initials: C
authors.lastname: Pisani
authors.forename: Chiara
authors.initials: C
authors.lastname: Giovanardi
authors.forename: Paola
authors.initials: P
authors.lastname: Luches
authors.forename: Sergio
authors.initials: S
authors.lastname: Valeri
authors.forename: Federico
authors.initials: F
authors.lastname: Boscherini