Oxide/metal interface distance and epitaxial strain in the NiO/Ag(001) system.
Geometric parameters of NiO films epitaxially grown on Ag(001) were determined using two independent experimental techniques and ab initio simulations. Primary beam diffraction modulated electron emission experiments determined that the NiO films grow with O on top of Ag and that the oxide/metal interface distance is d=2.3+/-0.1 A. Polarization-dependent x-ray absorption, at the Ni-K edge, determined the tetragonal strain (r( parallel )=2.046+/-0.009 A, r( perpendicular )=2.12+/-0.02 A) and d=2.37+/-0.05 A. Periodic slab model results agree with the experiments (d=2.40, r( parallel )=2.07, r( perpendicular )=2.10 A; the O-on-top configuration is the most stable).
Lamberti
Carlo
C
Department of Inorganic, Physical and Materials Chemistry, University of Torino, Via P. Giuria 7, I-10125 Torino, Italy. carlo.lamberti@unito.it
Groppo
Elena
E
Prestipino
Carmelo
C
Casassa
Silvia
S
Ferrari
Anna Maria
AM
Pisani
Cesare
C
Giovanardi
Chiara
C
Luches
Paola
P
Valeri
Sergio
S
Boscherini
Federico
F