Thermal stability of nanocrystalline diamond films grown by biased enhanced microwave plasma chemical vapor deposition.
The thermal stability of nanocrystalline diamond (NCD) films grown on mirror-polished silicon substrates by biased enhanced microwave plasma chemical vapor deposition was investigated. Different pieces of a NCD sample were annealed for 1 h in an ambient argon atmosphere at 200, 400, 600, and 800 degrees C. The structural and mechanical properties of as-grown and annealed samples were assessed. The surface roughness and high hardness of the samples remained fairly constant with annealing temperature.
Sharda
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T
Department of Environmental Technology and Urban Planning, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466 8555, Japan.
Soga
T
T
Jimbo
T
T
Umeno
M
M
D001128:Argon / Q000737:chemistry; D003460:Crystallization / Q000379:methods*; D003461:Crystallography / Q000379:methods; D018130:Diamond / Q000737:chemistry* / Q000302:isolation & purification; D005740:Gases / Q000737:chemistry; D006244:Hardness; D006358:Hot Temperature; D008422:Materials Testing; D008872:Microwaves; D008968:Molecular Conformation; D036103:Nanotechnology / Q000379:methods*; D011786:Quality Control; D011991:Receptors, Virus; D012825:Silicon / Q000737:chemistry; D013499:Surface Properties; D013696:Temperature
D005740:Gases; D011991:Receptors, Virus; D001128:Argon; D018130:Diamond; D012825:Silicon