title: Fine-pitched microgratings encoded by interference of UV femtosecond laser pulses.
abstract: Fine-pitched microgratings are encoded on fused silica surfaces by a two-beam laser interference technique employing UV femtosecond pulses from the third harmonics of a Ti:sapphire laser. A pump and prove method utilizing a laser-induced optical Kerr effect or transient optical absorption change has been developed to achieve the time coincidence of the two pulses. Use of the UV pulses makes it possible to narrow the grating pitches to an opening as small as 290 nm, and the groove width of the gratings is of nanoscale size. The present technique provides a novel opportunity for the fabrication of periodic nanoscale structures in various materials.
authors.affiliation: Hosono Transparent Electro-Active Materials Project, ERATO, Japan Science and Technology Corporation, KSP C-1232, Sakato 3-2-1, Takatsu-ku, Kawasaki 213-0012, Japan.
authors.forename: Hayato
authors.initials: H
authors.lastname: Kamioka
authors.forename: Taisuke
authors.initials: T
authors.lastname: Miura
authors.forename: Ken-ichi
authors.initials: K
authors.lastname: Kawamura
authors.forename: Masahiro
authors.initials: M
authors.lastname: Hirano
authors.forename: Hideo
authors.initials: H
authors.lastname: Hosono
mesh_terms: D006358:Hot Temperature; D007368:Interferometry / Q000295:instrumentation / Q000379:methods*; D007834:Lasers; D036103:Nanotechnology / Q000295:instrumentation / Q000379:methods*; D012822:Silicon Dioxide / Q000737:chemistry / Q000528:radiation effects*; D013499:Surface Properties; D014466:Ultraviolet Rays
chemical_list: D012822:Silicon Dioxide