title: Rapid prototyping of 2D structures with feature sizes larger than 8 microm.
abstract: This paper extends rapid prototyping for several types of lithography to the 8-25-microm size range, using transparency photomasks prepared by photoplotting. It discusses the technical improvement in photomask quality achieved by photoplotting, compared to the currently used image setting, and demonstrates differences in the resolution that can be obtained with photomasks with features in the 8-100-microm size range. These high-resolution photomasks were used to microfabricate microelectrodes, microlenses, and stamps for microcontact printing, following methods described previously.
authors.affiliation: Department of Chemistry and Chemical Biology, Harvard University, 12 Oxford Street, Cambridge, Massuchusetts 02138, USA.
authors.forename: Vincent
authors.initials: V
authors.lastname: Linder
authors.forename: Hongkai
authors.initials: H
authors.lastname: Wu
authors.forename: Xingyu
authors.initials: X
authors.lastname: Jiang
authors.forename: George M
authors.initials: GM
authors.lastname: Whitesides
mesh_terms: D001681:Biological Assay / Q000295:instrumentation / Q000379:methods; D005353:Fibronectins / Q000032:analysis / Q000737:chemistry; D008856:Microscopy, Fluorescence; D036103:Nanotechnology / Q000295:instrumentation; D010781:Photography / Q000295:instrumentation* / Q000379:methods
chemical_list: D005353:Fibronectins