New bonding modes of gas-phase deposited gamma-aminopropyltriethoxysilane on silica studied by 29Si CP/MAS NMR.
Besides the well-known reaction between the ethoxy groups of the silane end of the gamma-aminopropyltriethoxysilane (APTS) molecule and the silanols of silica, the amino ends of APTS molecules were observed to react in the gas phase with ethoxy groups of other APTS molecules and silanols of silica at elevated temperatures on the silica surface, dehydroxylated at 600 degrees C, forming Si-N linkages, as established by 29Si CP/MAS NMR.
Ek
Satu
S
Laboratory of Inorganic and Analytical Chemistry, Helsinki University of Technology, P.O. Box 6100, FIN-02015 Espoo, Finland.
Iiskola
Eero I
EI
Niinistö
Lauri
L
Pakkanen
Tuula T
TT
Root
Andrew
A
D000327:Adsorption; D005740:Gases / Q000737:chemistry; D009682:Magnetic Resonance Spectroscopy / Q000379:methods*; D013058:Mass Spectrometry / Q000379:methods*; D008956:Models, Chemical; D011437:Propylamines; D012821:Silanes / Q000737:chemistry*; D012822:Silicon Dioxide / Q000737:chemistry*; D013499:Surface Properties; D013696:Temperature
D005740:Gases; D011437:Propylamines; D012821:Silanes; D012822:Silicon Dioxide; C477625:amino-propyl-triethoxysilane