title: [Study on the formation of XeCl at low pressure].
abstract: Low pressure dielectric barrier discharge was used to study the formation of XeCl excimer in a mixture of Xe/Cl2 in the range of 70-1,330 Pa. The fluorescence emission spectra in the range of 285-315 nm at different pressure and ratio of Xe/Cl2 were measured. The results indicate that near 308 nm the emission intensities of XeCl formed under the experimental conditions varied with different total pressure and ratio of Xe/Cl2, and the formation efficiency of XeCl excimer reached maximum value at the ratio of 4:1.
authors.affiliation: College of Physics and Technology, Hebei University, Baoding 071002, China.
authors.forename: Xiao-hui
authors.initials: XH
authors.lastname: Zhao
authors.forename: Lian-shui
authors.initials: LS
authors.lastname: Zhang
authors.forename: Li
authors.initials: L
authors.lastname: Han
mesh_terms: D001274:Atmospheric Pressure; D002712:Chlorides / Q000737:chemistry*; D004560:Electricity; D007834:Lasers; D011312:Pressure; D013050:Spectrometry, Fluorescence; D014978:Xenon / Q000737:chemistry*
chemical_list: D002712:Chlorides; D014978:Xenon; C048006:xenon chloride