Tunable surface oxidation states in Si/SiO2 nanostructures prepared from Si/SiQ2 mixtures and phenol hydroxylation activity.
Gole
James L
JL
School of Physics, Georgia Institute of Technology, Atlanta, GA 30332-0100, USA. james.gole@physics.gatech.edu
Shinall
Brian D
BD
Iretskii
Alexei V
AV
White
Mark G
MG
Carter
W Brent
WB
Erickson
Ann S
AS
D002384:Catalysis; D006861:Hydrogen Peroxide / Q000737:chemistry; D006900:Hydroxylation; D008956:Models, Chemical; D015394:Molecular Structure; D036103:Nanotechnology / Q000379:methods*; D010084:Oxidation-Reduction; D010316:Particle Size; D019800:Phenol / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry*; D012822:Silicon Dioxide / Q000737:chemistry*; D013499:Surface Properties; D013997:Time Factors
D019800:Phenol; D012822:Silicon Dioxide; D006861:Hydrogen Peroxide; D012825:Silicon