title: Ferroelectric emission studies for electron emission lithography applications.
abstract: Ferroelectric switching emission, dielectric switching emission, and pyroelectric emission were studied by patterning images on electron resist for electron emission lithography applications. It was observed that the pyroelectric emission is most acceptable for a high throughput 1:1 electron projection lithography application. A 1:1 electron projection lithography was demonstrated by patterning images with line widths of 30 microm and using pyroelectric emission. A degradation of the pyroelectric emission property of the material was observed during repeated heating cycles below the phase-transition temperature of the ferroelectric material. Annealing excursions above the phase transition temperature prevented the degradation of the pyroelectric emitter.
authors: Samsung Advanced Institute of Technology, Suwon, Kyongki 440-600, Korea.
authors: In K
authors: IK
authors: Yoo
authors: Sang O
authors: SO
authors: Ryu
authors: Carlos T A
authors: CT
authors: Suchicital
authors: June K
authors: JK
authors: Lee
authors: Byong M
authors: BM
authors: Kim
authors: Chee W
authors: CW
authors: Chung