title: Alveolar distraction before insertion of dental implants in the posterior mandible.
abstract: We investigated the efficacy of alveolar distraction for reducing crown height:implant length ratio in the posterior mandible. Ten alveolar distractions were done in seven patients. The pre-distraction ratio of required crown height to bone height available for implantation was in all cases > or =1. Two implants were placed in each distracted area (total 20 implants). Before distraction, the mean (SD) predicted crown height was 12.8 (2.1) mm; mean bone height available for implantation was 7.8 (1.5) mm. After distraction and insertion of implants, mean crown height was 8.1 (1.9) mm, and mean implant length was 11.3 (1.9) mm. Before distraction, the mean required crown height:available bone height ratio was 1.7 (0.3); after distraction and insertion of implants, the mean crown:implant ratio was 0.7 (0.2) (P<0.0005). Alveolar distraction is effective for increasing the height of the alveolar ridge in the posterior mandibular region, and should be considered when the height of the predicted crown that is required is greater than or equal to the maximum height of bone available for implantation.
authors: Department of Maxillofacial Surgery, Complejo Hospitalario Universitario de Santiago, Santiago de Compostela, Spain. ciabelgg@usc.es
authors: A
authors: A
authors: Garcia-Garcia
authors: M
authors: M
authors: Somoza-Martin
authors: P
authors: P
authors: Gandara-Vila
authors: N
authors: N
authors: Saulacic
authors: J M
authors: JM
authors: Gandara-Rey
mesh_terms: D000328:Adult; D000539:Alveolar Process / Q000473:pathology; D000543:Alveoloplasty / Q000379:methods*; D002508:Cephalometry; D015921:Dental Implants; D017267:Dental Prosthesis Design; D005260:Female; D005500:Follow-Up Studies; D006801:Humans; D007576:Jaw, Edentulous, Partially / Q000473:pathology / Q000601:surgery; D008297:Male; D008334:Mandible / Q000473:pathology / Q000601:surgery*; D019857:Osteogenesis, Distraction / Q000379:methods; D014716:Vertical Dimension
chemical_list: D015921:Dental Implants