title: Mo:Y multilayer mirror technology utilized to image the near-field output of a Ni-like Sn laser at 11.9 nm.
abstract: Although bright x-ray sources exist at shorter wavelengths, the development of sophisticated diagnostics with x-ray laser sources has been restricted to wavelengths longer than 12.5 nm because of the limitations of the widely used Mo:Si multilayer mirrors. With the novel Mo:Y multilayer mirrors that we present, many x-ray laser applications can be extended to the 7-12-nm range. We demonstrate this new capability by imaging the near-field output of the Ni-like Sn laser at 11.9 nm.
authors.affiliation: Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, California 94551, USA. jnilsen@llnl.gov
authors.forename: Joseph
authors.initials: J
authors.lastname: Nilsen
authors.forename: Sasa
authors.initials: S
authors.lastname: Bajt
authors.forename: Henry N
authors.initials: HN
authors.lastname: Chapman
authors.forename: Felix
authors.initials: F
authors.lastname: Staub
authors.forename: Jürg
authors.initials: J
authors.lastname: Balmer