Replication of vertical features smaller than 2 nm by soft lithography.
This communication demonstrates a simple, soft lithographic approach to the replication and metrology of nanoscale vertical displacements. We patterned test structures with regular patterns that minimize artifacts in measurements by atomic force microscopy. A composite stamp of poly(dimethylsiloxane) (PDMS) molded against the original test structure served as a template to generate polyurethane replicas. We replicated vertical displacements down to approximately 1.5 nm. This replication demonstrates the capability of soft lithography to reproduce features with dimensions similar to those of large molecules.
Gates
Byron D
BD
Department of Chemistry and Chemical Biology, Harvard University, 12 Oxford Street, Cambridge, Massachusetts 02138, USA.
Whitesides
George M
GM
D036103:Nanotechnology / Q000379:methods*; D019904:Polymethyl Methacrylate / Q000737:chemistry*; D011327:Printing / Q000379:methods*
D019904:Polymethyl Methacrylate