A novel fabrication of meso-porous silica film by sol-gol of TEOS.
A homogeneous crack-free nano- or meso-porous silica films on silicon was fabricated by colloidal silica sol derived by hydrolyzing tetraethyl orthosilicate (TEOS) catalyzing with (C4H9)4N+OH- in water medium. The solution with ratio of H2O/TEOS> or =15, R4N+ and glycerol as templates, combining with the hydrolyzed intermediate, controlled the silica aggregating; the templated silica film with heterostructure was developed into homogeneous nano-porous then meso-porous silica films after being annealed from 750 degrees C to 850 degrees C; the formation mechanism of the porous silica films was discussed; morphologies of the silica films were characterized. The refractive indexes of the porous silica films were 1.256-1.458, the thermal conductivity < 0.7 W/m/K. The fabricating procedure and the sequence had not been reported before.
Electronic Materials Research Laboratory, Xi'an Jiaotong University, Xi'an 710049, China. ymingzhi@nwpu.edu.cn
Ming-zhi
MZ
Yin
Xi
X
Yao
Liang-ying
LY
Zhang
D003102:Colloids; D005782:Gels; D008855:Microscopy, Electron, Scanning; D036103:Nanotechnology; D010316:Particle Size; D012821:Silanes; D012822:Silicon Dioxide / Q000302:isolation & purification*
D003102:Colloids; D005782:Gels; D012821:Silanes; C040733:tetraethoxysilane; D012822:Silicon Dioxide