Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses.
The damage threshold and damage mechanism of extreme-ultraviolet Sc/Si multilayer mirror coatings are investigated with focused nanosecond pulses at 46.9-nm radiation from a compact capillary-discharge laser. Damage threshold fluences of approximately 0.08 J/cm2 are measured for coatings deposited on both borosilicate glass and Si substrates. The use of scanning and transmission electron microscopy and small-angle x-ray diffraction techniques reveals the thermal nature of the damage mechanism. The results are relevant to the use of newly developed high-flux extreme-ultraviolet sources in applications.
Grisham
M
M
National Science Foundation Engineering Research Center for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, Colorado 80523, USA.
Vaschenko
G
G
Menoni
C S
CS
Rocca
J J
JJ
Pershyn
Yu P
YP
Zubarev
E N
EN
Voronov
D L
DL
Sevryukova
V A
VA
Kondratenko
V V
VV
Vinogradov
A V
AV
Artioukov
I A
IA