title: Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses.
abstract: The damage threshold and damage mechanism of extreme-ultraviolet Sc/Si multilayer mirror coatings are investigated with focused nanosecond pulses at 46.9-nm radiation from a compact capillary-discharge laser. Damage threshold fluences of approximately 0.08 J/cm2 are measured for coatings deposited on both borosilicate glass and Si substrates. The use of scanning and transmission electron microscopy and small-angle x-ray diffraction techniques reveals the thermal nature of the damage mechanism. The results are relevant to the use of newly developed high-flux extreme-ultraviolet sources in applications.
authors.affiliation: National Science Foundation Engineering Research Center for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, Colorado 80523, USA.
authors.forename: M
authors.initials: M
authors.lastname: Grisham
authors.forename: G
authors.initials: G
authors.lastname: Vaschenko
authors.forename: C S
authors.initials: CS
authors.lastname: Menoni
authors.forename: J J
authors.initials: JJ
authors.lastname: Rocca
authors.forename: Yu P
authors.initials: YP
authors.lastname: Pershyn
authors.forename: E N
authors.initials: EN
authors.lastname: Zubarev
authors.forename: D L
authors.initials: DL
authors.lastname: Voronov
authors.forename: V A
authors.initials: VA
authors.lastname: Sevryukova
authors.forename: V V
authors.initials: VV
authors.lastname: Kondratenko
authors.forename: A V
authors.initials: AV
authors.lastname: Vinogradov
authors.forename: I A
authors.initials: IA
authors.lastname: Artioukov