title: X-ray diffraction study of the ultrathin Al2O3 layer on NiAl110.
abstract: Ultrathin Al2O3 layers on alloys are used as templates for model catalysts, tunneling barriers in electronic devices, or corrosion-resistant layers. The complex atomic structure of well-ordered alumina overlayers on NiAl110 was solved by surface x-ray diffraction. The oxide layer is composed of a double layer of strongly distorted hexagonal oxygen ions that hosts aluminum ions on both octahedral and tetrahedral sites with equal probability. The alumina overlayer exhibits a domain structure that can be related to characteristic growth defects and is generated during the growth of a hexagonally ordered overlayer (Al2O3) on a body-centered cubic (110) substrate (NiAl).
authors.affiliation: Max-Planck-Institut (MPI) für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany. stierle@mf.mpg.de
authors.forename: A
authors.initials: A
authors.lastname: Stierle
authors.forename: F
authors.initials: F
authors.lastname: Renner
authors.forename: R
authors.initials: R
authors.lastname: Streitel
authors.forename: H
authors.initials: H
authors.lastname: Dosch
authors.forename: W
authors.initials: W
authors.lastname: Drube
authors.forename: B C
authors.initials: BC
authors.lastname: Cowie