title: UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane).
abstract: Thin films of a cobalt-clusterized poly(ferrocenylsilane) have been shown to behave as a negative-tone resist for UV photolithography, allowing access to feature sizes between 20 and 300 microm. Pyrolysis of the patterned polymer at 900 degrees C under a N(2) atmosphere afforded patterned ferromagnetic ceramics with excellent shape retention.
authors.affiliation: Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario, Canada M5S 3H6.
authors.forename: Alison Y
authors.initials: AY
authors.lastname: Cheng
authors.forename: Scott B
authors.initials: SB
authors.lastname: Clendenning
authors.forename: Guocheng
authors.initials: G
authors.lastname: Yang
authors.forename: Zheng-Hong
authors.initials: ZH
authors.lastname: Lu
authors.forename: Christopher M
authors.initials: CM
authors.lastname: Yip
authors.forename: Ian
authors.initials: I
authors.lastname: Manners