Application of transmission electron microscopes to nanometre-sized fabrication by means of electron beam-induced deposition.
Electron beam-induced deposition was carried out using a scanning transmission electron microscope with a field emission gun to fabricate nanometre-sized structures. A small amount of a metal-organic gas was introduced near the substrate in the microscope chamber, and focused electron beams were irradiated. Two- and three-dimensional structures were fabricated by scanning the beam position. The minimum line width of the freestanding structures was 8 nm at a constant gas flux used. This line width of 8 nm is considered to be achieved by employing a high accelerating voltage, which leads to a small probe size, and the optimum scanning speed.
Shimojo
M
M
National Institute for Materials Science, Nano-Materials Laboratory, 3-13 Sakura, Tsukuba 305-0003, Japan. Shimojo.Masayuki@nims.go.jp
Mitsuishi
K
K
Tanaka
M
M
Han
M
M
Furuya
K
K
D021621:Imaging, Three-Dimensional / Q000295:instrumentation* / Q000379:methods*; D008854:Microscopy, Electron / Q000295:instrumentation*