Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer.
Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.
Zhang
Guo-Jun
GJ
Nanotechnology Research Center, Waseda University, Waseda Tsurumaki-cho 513, Shinjuku-ku, Tokyo 162-0041, Japan. zhang@kaw.comm.waseda.ac.jp
Tanii
Takashi
T
Funatsu
Takashi
T
Ohdomari
Iwao
I
D004247:DNA / Q000737:chemistry*; D008854:Microscopy, Electron / Q000379:methods*; D008856:Microscopy, Fluorescence; D049329:Nanostructures / Q000737:chemistry*; D009838:Oligodeoxyribonucleotides / Q000737:chemistry*; D017646:Organosilicon Compounds / Q000737:chemistry; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties
D009838:Oligodeoxyribonucleotides; D017646:Organosilicon Compounds; C102207:n-octadecyltrimethoxysilane; D004247:DNA; D012825:Silicon