title: Scanning Kelvin Microscope: a new method for surface investigations.
abstract: Based on the well known Kelvin probe for work function measurements a new microstructure analysis system - the Scanning Kelvin Microscope - has been developed. It allows to measure simultaneously with high lateral resolution the distribution of the contact potential difference (CPD) between a conductive sample and a reference probe together with the topographical structure of the sample surface. The measurement is contact free and non-destructive and can be carried out in natural environments. At present the lateral resolution of the measurement approaches 5 microm. The results can be displayed on a computer in three dimensional colour pictures.
authors.affiliation: Institut für Physik, Fakultät für Elektrotechnik, Universität der Bundeswehr München, Werner-Heisenberg-Weg 39, D-85577, Neubiberg, Germany.
authors.forename: J
authors.initials: J
authors.lastname: Ren
authors.forename: H D
authors.initials: HD
authors.lastname: Liess
authors.forename: R
authors.initials: R
authors.lastname: Mäckel
authors.forename: H
authors.initials: H
authors.lastname: Baumgärtner