UV photopatterning of a highly metallized, cluster-containing poly(ferrocenylsilane).
Thin films of a cobalt-clusterized poly(ferrocenylsilane) have been shown to behave as a negative-tone resist for UV photolithography, allowing access to feature sizes between 20 and 300 microm. Pyrolysis of the patterned polymer at 900 degrees C under a N(2) atmosphere afforded patterned ferromagnetic ceramics with excellent shape retention.
Cheng
Alison Y
AY
Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario, Canada M5S 3H6.
Clendenning
Scott B
SB
Yang
Guocheng
G
Lu
Zheng-Hong
ZH
Yip
Christopher M
CM
Manners
Ian
I