title: AFM and XRD investigation of crystalline vapor-deposited C(60) films.
abstract: The morphological and structural properties of C(60) films deposited on quartz substrates by sublimation at 320-500 degrees C under high vacuum have been investigated using atomic force microscopy (AFM) and reflection X-ray diffraction (RXRD). The thickness of the films varied between 0.2 microm and 10 microm. AFM showed that the films consist predominantly of cubic crystals of a few micrometer in size with well-developed (111) and (100) faces. The crystallographic investigation revealed a strongly preferred [111] growth direction which is very sensitive to the deposition rate and substrate temperature. The influence of the experimental parameters on the morphology of the crystals and on the preferred orientation of the films is discussed in view of the AFM and RXRD results.
authors.affiliation: Department of Chemical Engineering and Industrial Chemistry, Swiss Federal Institute of Technology, ETH-Zentrum, CH-8092, Zürich, Switzerland.
authors.forename: F
authors.initials: F
authors.lastname: Atamny
authors.forename: A
authors.initials: A
authors.lastname: Baiker
authors.forename: H J
authors.initials: HJ
authors.lastname: Muhr
authors.forename: R
authors.initials: R
authors.lastname: Nesper