title: Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer.
abstract: Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.
authors.affiliation: Nanotechnology Research Center, Waseda University, Waseda Tsurumaki-cho 513, Shinjuku-ku, Tokyo 162-0041, Japan. zhang@kaw.comm.waseda.ac.jp
authors.forename: Guo-Jun
authors.initials: GJ
authors.lastname: Zhang
authors.forename: Takashi
authors.initials: T
authors.lastname: Tanii
authors.forename: Takashi
authors.initials: T
authors.lastname: Funatsu
authors.forename: Iwao
authors.initials: I
authors.lastname: Ohdomari
mesh_terms: D004247:DNA / Q000737:chemistry*; D008854:Microscopy, Electron / Q000379:methods*; D008856:Microscopy, Fluorescence; D049329:Nanostructures / Q000737:chemistry*; D009838:Oligodeoxyribonucleotides / Q000737:chemistry*; D017646:Organosilicon Compounds / Q000737:chemistry; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D009838:Oligodeoxyribonucleotides; D017646:Organosilicon Compounds; C102207:n-octadecyltrimethoxysilane; D004247:DNA; D012825:Silicon