title: Application of transmission electron microscopes to nanometre-sized fabrication by means of electron beam-induced deposition.
abstract: Electron beam-induced deposition was carried out using a scanning transmission electron microscope with a field emission gun to fabricate nanometre-sized structures. A small amount of a metal-organic gas was introduced near the substrate in the microscope chamber, and focused electron beams were irradiated. Two- and three-dimensional structures were fabricated by scanning the beam position. The minimum line width of the freestanding structures was 8 nm at a constant gas flux used. This line width of 8 nm is considered to be achieved by employing a high accelerating voltage, which leads to a small probe size, and the optimum scanning speed.
authors.affiliation: National Institute for Materials Science, Nano-Materials Laboratory, 3-13 Sakura, Tsukuba 305-0003, Japan. Shimojo.Masayuki@nims.go.jp
authors.forename: M
authors.initials: M
authors.lastname: Shimojo
authors.forename: K
authors.initials: K
authors.lastname: Mitsuishi
authors.forename: M
authors.initials: M
authors.lastname: Tanaka
authors.forename: M
authors.initials: M
authors.lastname: Han
authors.forename: K
authors.initials: K
authors.lastname: Furuya
mesh_terms: D021621:Imaging, Three-Dimensional / Q000295:instrumentation* / Q000379:methods*; D008854:Microscopy, Electron / Q000295:instrumentation*