title: Self-limited growth of a thin oxide layer on Rh(111).
abstract: The oxidation of the Rh(111) surface at oxygen pressures from 10(-10) mbar to 0.5 bar and temperatures between 300 and 900 K has been studied on the atomic scale using a multimethod approach of experimental and theoretical techniques. Oxidation starts at the steps, resulting in a trilayer O-Rh-O surface oxide which, although not thermodynamically stable, prevents further oxidation at intermediate pressures. A thick corundum like Rh2O3 bulk oxide is formed only at significantly higher pressures and temperatures.
authors.affiliation: Department of Synchrotron Radiation Research, Lund University, Box 118, S-221 00, Sweden. johan.gustafson@sljus.lu.se
authors.forename: J
authors.initials: J
authors.lastname: Gustafson
authors.forename: A
authors.initials: A
authors.lastname: Mikkelsen
authors.forename: M
authors.initials: M
authors.lastname: Borg
authors.forename: E
authors.initials: E
authors.lastname: Lundgren
authors.forename: L
authors.initials: L
authors.lastname: Köhler
authors.forename: G
authors.initials: G
authors.lastname: Kresse
authors.forename: M
authors.initials: M
authors.lastname: Schmid
authors.forename: P
authors.initials: P
authors.lastname: Varga
authors.forename: J
authors.initials: J
authors.lastname: Yuhara
authors.forename: X
authors.initials: X
authors.lastname: Torrelles
authors.forename: C
authors.initials: C
authors.lastname: Quirós
authors.forename: J N
authors.initials: JN
authors.lastname: Andersen