title: N2O removal in N2 or air by ArF excimer laser photolysis at atmospheric pressure.
abstract: A photochemical process is proposed as a new efficient N(2)O removal technique in N(2) or air at atmospheric pressure and room temperature without using any catalysts. N(2)O diluted in N(2) or air was decomposed into N(2), O(2), and NO by using a 193 nm ArF excimer laser. The maximum conversion of N(2)O in N(2)O/N(2) or N(2)O/N(2)/O(2) mixtures was 93% at a laser power of 136 mJ, a repetition frequency of 5 Hz, and an irradiation time of 30 min. The formation ratios of N(2):O(2):NO in N(2)O/N(2) and N(2)O/N(2)/O(2) mixtures were 64:31:5.1% and 60:27:13%, respectively. The decomposition mechanism of N(2)O under 193 nm photolysis was discussed by comparing experimental data with calculated model using known photochemical and gas kinetic data.
authors.affiliation: Department of Applied Science for Electronics and Materials, Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan. tsuji@cm.kyushu-u.ac.jp
authors.forename: Masaharu
authors.initials: M
authors.lastname: Tsuji
authors.forename: Jun
authors.initials: J
authors.lastname: Kumagae
authors.forename: Takeshi
authors.initials: T
authors.lastname: Tsuji
authors.forename: Taro
authors.initials: T
authors.lastname: Hamagami
mesh_terms: D000388:Air; D001128:Argon; D001274:Atmospheric Pressure; D002617:Chemical Industry / Q000379:methods; D005461:Fluorine; D007834:Lasers; D009584:Nitrogen; D009609:Nitrous Oxide / Q000737:chemistry* / Q000528:radiation effects; D010782:Photolysis; D013696:Temperature
chemical_list: D005461:Fluorine; D001128:Argon; D009609:Nitrous Oxide; D009584:Nitrogen