Dissociation of a product of a surface reaction in the gas phase: XeF2 reaction with Si.
Xenon difluoride interacts with Si(100)2 x 1 by atom abstraction, whereby a dangling bond abstracts a F atom from XeF2, scattering the complementary XeF. Partitioning of the reaction exothermicity produces sufficient XeF rovibrational excitation for dissociation to occur. The resulting F and Xe atoms are shown to arise from dissociation of XeF in the gas phase by demonstrating that the angle-resolved velocity distributions of F, Xe, and XeF conserve momentum, energy, and mass. This experiment documents the first observation of dissociation of a surface reaction product in the gas phase.
Hefty
R C
RC
Department of Chemistry, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.
Holt
J R
JR
Tate
M R
MR
Gosalvez
D B
DB
Bertino
M F
MF
Ceyer
S T
ST