title: Dissociation of a product of a surface reaction in the gas phase: XeF2 reaction with Si.
abstract: Xenon difluoride interacts with Si(100)2 x 1 by atom abstraction, whereby a dangling bond abstracts a F atom from XeF2, scattering the complementary XeF. Partitioning of the reaction exothermicity produces sufficient XeF rovibrational excitation for dissociation to occur. The resulting F and Xe atoms are shown to arise from dissociation of XeF in the gas phase by demonstrating that the angle-resolved velocity distributions of F, Xe, and XeF conserve momentum, energy, and mass. This experiment documents the first observation of dissociation of a surface reaction product in the gas phase.
authors.affiliation: Department of Chemistry, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.
authors.forename: R C
authors.initials: RC
authors.lastname: Hefty
authors.forename: J R
authors.initials: JR
authors.lastname: Holt
authors.forename: M R
authors.initials: MR
authors.lastname: Tate
authors.forename: D B
authors.initials: DB
authors.lastname: Gosalvez
authors.forename: M F
authors.initials: MF
authors.lastname: Bertino
authors.forename: S T
authors.initials: ST
authors.lastname: Ceyer