title: Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics.
abstract: A new figure correction method has been applied in order to fabricate an elliptical mirror to realize a one-dimensionally diverging X-ray beam having high image quality. Mutual relations between figure errors and intensity uniformities of diverging X-ray beams have also been investigated using a wave-optical simulator and indicate that figure errors in relatively short spatial wavelength ranges lead to high-contrast interference fringes. By using a microstitching interferometer and elastic emission machining, figure correction of an elliptical mirror with a lateral resolution close to 0.1 mm was carried out. A one-dimensional diverging X-ray obtained using the fabricated mirror was observed at SPring-8 and evaluated to have a sufficiently flat intensity distribution.
authors.affiliation: Department of Precision Science and Technology, Osaka University, Yamada-Oka 2-1, Suita, Osaka 565-0871, Japan. mimura@prec.eng.osaka-u.ac.jp
authors.forename: Hidekazu
authors.initials: H
authors.lastname: Mimura
authors.forename: Kazuto
authors.initials: K
authors.lastname: Yamauchi
authors.forename: Kazuya
authors.initials: K
authors.lastname: Yamamura
authors.forename: Akihisa
authors.initials: A
authors.lastname: Kubota
authors.forename: Satoshi
authors.initials: S
authors.lastname: Matsuyama
authors.forename: Yasuhisa
authors.initials: Y
authors.lastname: Sano
authors.forename: Kazumasa
authors.initials: K
authors.lastname: Ueno
authors.forename: Katsuyoshi
authors.initials: K
authors.lastname: Endo
authors.forename: Yoshinori
authors.initials: Y
authors.lastname: Nishino
authors.forename: Kenji
authors.initials: K
authors.lastname: Tamasaku
authors.forename: Makina
authors.initials: M
authors.lastname: Yabashi
authors.forename: Tetsuya
authors.initials: T
authors.lastname: Ishikawa
authors.forename: Yuzo
authors.initials: Y
authors.lastname: Mori
mesh_terms: D004867:Equipment Design; D019544:Equipment Failure Analysis; D008853:Microscopy / Q000295:instrumentation* / Q000379:methods*; D055095:Optics and Photonics / Q000295:instrumentation*; D015203:Reproducibility of Results; D012680:Sensitivity and Specificity; D014965:X-Rays