title: Dip-pen nanolithography with poly(diallyl dimethyl ammonium) chloride.
abstract: Poly(diallyl dimethyl ammonium) chloride (PDAC), a high molecular weight cationic polyelectrolyte, was used as ink for dip-pen nanolithography. Line patterns were generated on bare silicon wafers directly with PDAC-coated tips. Widths and heights of lines increased with decreasing scan rates. At the same scan rate, widths and heights of patterning decreased with increasing PDAC molecular weight. The dependence of line width on inverse writing speed was found to be consistent with a modified diffusion model.
authors.affiliation: Department of Materials Science & Engineering, University of Florida, Gainesville, Florida, USA.
authors.forename: Bumsu
authors.initials: B
authors.lastname: Kim
authors.forename: Georgios
authors.initials: G
authors.lastname: Pyrgiotakis
authors.forename: Wolfgang M
authors.initials: WM
authors.lastname: Sigmund
mesh_terms: D003198:Computer Simulation; D003460:Crystallization / Q000379:methods*; D004058:Diffusion; D008420:Manufactured Materials / Q000032:analysis*; D008422:Materials Testing / Q000379:methods*; D018625:Microscopy, Atomic Force / Q000379:methods*; D008956:Models, Chemical; D008970:Molecular Weight; D036103:Nanotechnology / Q000379:methods*; D011095:Polyethylenes / Q000032:analysis / Q000737:chemistry*; D011327:Printing / Q000379:methods; D000644:Quaternary Ammonium Compounds / Q000032:analysis / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D011095:Polyethylenes; D000644:Quaternary Ammonium Compounds; C041004:poly-N,N-dimethyl-N,N-diallylammonium chloride