title: Mononuclear precursor for MOCVD of HfO2 thin films.
abstract: We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(O(i)Pr)2(tbaoac)2] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor.
authors.affiliation: Inorganic Materials Chemistry Group, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum, Universitätsstr. 150, D-44780 Bochum, Germany.
authors.forename: Arne
authors.initials: A
authors.lastname: Baunemann
authors.forename: Reji
authors.initials: R
authors.lastname: Thomas
authors.forename: Ralf
authors.initials: R
authors.lastname: Becker
authors.forename: Manuela
authors.initials: M
authors.lastname: Winter
authors.forename: Roland A
authors.initials: RA
authors.lastname: Fischer
authors.forename: Peter
authors.initials: P
authors.lastname: Ehrhart
authors.forename: Rainer
authors.initials: R
authors.lastname: Waser
authors.forename: Anjana
authors.initials: A
authors.lastname: Devi