Design of beamline optics for EUVL.
The design of front-end collimating optics for extreme-ultraviolet lithography (EUVL) is reported. For EUVL, collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror can achieve shorter optical path lengths than collimating optics consisting of two concave toroidal mirrors. Collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror are discussed. The design of collimating optics for EUVL beamlines based on ray-tracing studies is described.
Watanabe
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Himeji Institute of Technology, 2167 Shosha, Himeji, Hyogo 671-22, Japan.
Haga
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Niibe
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Kinoshita
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