Mononuclear precursor for MOCVD of HfO2 thin films.
We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(O(i)Pr)2(tbaoac)2] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor.
Baunemann
Arne
A
Inorganic Materials Chemistry Group, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum, Universitätsstr. 150, D-44780 Bochum, Germany.
Thomas
Reji
R
Becker
Ralf
R
Winter
Manuela
M
Fischer
Roland A
RA
Ehrhart
Peter
P
Waser
Rainer
R
Devi
Anjana
A