title: Design of beamline optics for EUVL.
abstract: The design of front-end collimating optics for extreme-ultraviolet lithography (EUVL) is reported. For EUVL, collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror can achieve shorter optical path lengths than collimating optics consisting of two concave toroidal mirrors. Collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror are discussed. The design of collimating optics for EUVL beamlines based on ray-tracing studies is described.
authors.affiliation: Himeji Institute of Technology, 2167 Shosha, Himeji, Hyogo 671-22, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Watanabe
authors.forename: T
authors.initials: T
authors.lastname: Haga
authors.forename: M
authors.initials: M
authors.lastname: Niibe
authors.forename: H
authors.initials: H
authors.lastname: Kinoshita