title: The outermost atomic layer of thin films of fluorinated polymethacrylates.
abstract: In this paper, we investigate the surface properties of a series of copolymers of perfluoroalkyl methacrylate (CH2 = C(CH3)COOCH2CnF(2n + 1), n = 1, 6, or 10) and methyl methacrylate (MMA) and of blends of perfluorooctyl-end-capped poly(methyl methacrylate) (PMMA) and pure PMMA. The introduction of perfluoroalkyl groups significantly lowers the polymer surface energy as determined by the acid-base approach. X-ray photoelectron spectroscopy (XPS) confirms a higher fluorine concentration in the surface region (the outer 3.8 nm) as compared to in the bulk. The fluorine density in the outermost atomic layer is quantitatively determined by low-energy ion scattering (LEIS). A linear relationship is found between the fluorine density in the outermost atomic layer and the surface energy of the partially fluorinated polymethacrylates, irrespective of the length of the perfluoroalkyl chain. This linearity confirms Langmuir's "principle of independent surface action". Deviation from this linear relationship exists for both highly and sparsely fluorinated polymethacrylates and can be ascribed to the local (surface) ordering of the fluorinated tails and MMA units, respectively. This study may offer one further step toward a deeper understanding of the correlations between macroscopic surface properties and microscopic surface chemical composition.
authors.affiliation: Laboratory of Coatings Technology, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.
authors.forename: R D
authors.initials: RD
authors.lastname: van de Grampel
authors.forename: W
authors.initials: W
authors.lastname: Ming
authors.forename: A
authors.initials: A
authors.lastname: Gildenpfennig
authors.forename: W J H
authors.initials: WJ
authors.lastname: van Gennip
authors.forename: J
authors.initials: J
authors.lastname: Laven
authors.forename: J W
authors.initials: JW
authors.lastname: Niemantsverdriet
authors.forename: H H
authors.initials: HH
authors.lastname: Brongersma
authors.forename: G
authors.initials: G
authors.lastname: de With
authors.forename: R
authors.initials: R
authors.lastname: van der Linde