title: Submicrometre-area high-energy-resolution photoelectron spectroscopy system.
abstract: A submicrometre-area photoelectron spectroscopy system that uses a multi-layer-coated Schwarzschild objective as the soft X-ray microbeam optics has been developed. The system is located at an undulator beamline (BL-16U) at the Photon Factory in the High Energy Accelerator Research Organization. By knife-edge measurement, the microbeam size was estimated to be 160 nm at the sample position using a 25-75% criterion. Photoelectron spectral measurements revealed that the Fermi edge width was 0.12 eV, which means that the instrumental resolution was 0.05 eV, after removing the natural broadening of the Fermi edge at room temperature. This system offers both high energy resolution and high spatial resolution.
authors.affiliation: NTT Basic Research Laboratories, 3-1 Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-01, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Kiyokura
authors.forename: F
authors.initials: F
authors.lastname: Maeda
authors.forename: Y
authors.initials: Y
authors.lastname: Watanabe
authors.forename: E
authors.initials: E
authors.lastname: Shigemasa
authors.forename: A
authors.initials: A
authors.lastname: Yagishita
authors.forename: M
authors.initials: M
authors.lastname: Oshima
authors.forename: Y
authors.initials: Y
authors.lastname: Iketaki
authors.forename: Y
authors.initials: Y
authors.lastname: Horikawa