(Ta/Si) multilayer as a wide-bandpass monochromator material.
Specular and non-specular X-ray reflectivity intensities of a (Ta/Si)(60) multilayer sample were measured to characterize its interface structure. Since the multilayer has a good reflectance at its multilayer peaks, its performance as a wide-bandpass monochromator for X-ray scattering experiments of polymers has been tested.
Park
Y J
YJ
Beamline Research Division, Pohang Accelerator Laboratory, POSTECH, Pohang 790-784, Korea.
Youn
H S
HS
Banerjee
S
S
Lee
D R
DR
Baik
H M
HM
Lee
K B
KB
Kim
K J
KJ
Moon
D W
DW