title: (Ta/Si) multilayer as a wide-bandpass monochromator material.
abstract: Specular and non-specular X-ray reflectivity intensities of a (Ta/Si)(60) multilayer sample were measured to characterize its interface structure. Since the multilayer has a good reflectance at its multilayer peaks, its performance as a wide-bandpass monochromator for X-ray scattering experiments of polymers has been tested.
authors.affiliation: Beamline Research Division, Pohang Accelerator Laboratory, POSTECH, Pohang 790-784, Korea.
authors.forename: Y J
authors.initials: YJ
authors.lastname: Park
authors.forename: H S
authors.initials: HS
authors.lastname: Youn
authors.forename: S
authors.initials: S
authors.lastname: Banerjee
authors.forename: D R
authors.initials: DR
authors.lastname: Lee
authors.forename: H M
authors.initials: HM
authors.lastname: Baik
authors.forename: K B
authors.initials: KB
authors.lastname: Lee
authors.forename: K J
authors.initials: KJ
authors.lastname: Kim
authors.forename: D W
authors.initials: DW
authors.lastname: Moon