Reinvestigation of CS2 dissociation at 193 nm by means of product state-selective vacuum ultraviolet laser ionization and velocity imaging.
A branching ratio of 1.6 +/- 0.3 for S(3P)/S(1D) is obtained for the dissociation of CS2 with very low fluence 193 nm laser (less than 2 mJ/cm2), in which the S(3P) and S(1D) have been state-selectively ionized using VUV lasers at different wavelengths. The anisotropy parameters betamax(3P) = 0.8 and betamax(1D) = 1.9 indicate that these channels are preferentially populated at different geometries and the lifetime is very short.
Xu
Dadong
D
Department of Chemistry, University of California-Davis, Davis, California 95616, USA.
Huang
Jianhua
J
Jackson
William M
WM