Use of the ultraviolet absorption spectrum of CF2 to determine the spatially resolved absolute CF2 density, rotational temperature, and vibrational distribution in a plasma etching reactor.
Broadband ultraviolet absorption spectroscopy has been used to determine CF(2) densities in a plasma etch reactor used for industrial wafer processing, using the CF(2) A (1)B(1)<--X (1)A(1) absorption spectrum. Attempts to fit the experimental spectra using previously published Franck-Condon factors gave poor results, and values for the higher vibrational levels of the A state [(0,v(2),0), with v(2) (')>6] from the ground state were missing; hence new values were calculated. These were computed for transitions between low-lying vibrational levels of CF(2) X (1)A(1) to vibrational levels of CF(2) A (1)B(1) (v(1) ('),v(2) ('),0) up to high values of the vibrational quantum numbers using high level ab initio calculations combined with an anharmonic Franck Condon factor method. The Franck Condon factors were used to determine the absorption cross sections of CF(2) at selected wavelengths, which in turn were used to calculate number densities from the experimental spectra. Number densities of CF(2) have been determined in different regions of the plasma, including the center of the plasma and outside the plasma volume, and CF(2) rotational temperatures and vibrational energy distributions were estimated. For absorption spectra obtained outside the confined plasma volume, the CF(2) density was determined as (0.39+/-0.08)x10(13) molecule cm(-3) and the vibrational and rotational temperatures were determined as 303 and 350 K, respectively. In the center of the plasma reactor, the CF(2) density is estimated as (3.0+/-0.6)x10(13) molecules cm(-3) with T(rot) approximately 500 K. The fitted vibrational distribution in the CF(2) ground state corresponds to two Boltzmann distributions with T(vib) approximately 300 and T(vib) approximately 1000 K, indicating that CF(2) molecules are initially produced highly vibrationally excited, but are partially relaxed in the plasma by collision.
Bulcourt
Nicolas
N
Laboratoire de Physique et Technologie des Plasmas (LPTP), Ecole Polytechnique, Palaiseau, France.
Booth
Jean-Paul
JP
Hudson
Eric A
EA
Luque
Jorge
J
Mok
Daniel K W
DK
Lee
Edmond P
EP
Chau
Foo-Tim
FT
Dyke
John M
JM