title: Reaction of the oxygen molecule at the Si(100)-SiO2 interface during silicon oxidation.
authors.affiliation: Institut de Théorie des Phénomènes Physiques (ITP), Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
authors.forename: Angelo
authors.initials: A
authors.lastname: Bongiorno
authors.forename: Alfredo
authors.initials: A
authors.lastname: Pasquarello