title: Off-axis electron holography with a dual-lens imaging system and its usefulness in 2-D potential mapping of semiconductor devices.
authors.affiliation: IBM Microelectronic Division, Zip 40E, Hudson Valley Research Park, 2070 Route 52, Hopewell Jct., NY 12533, USA. wangyy@us.ibm.com
authors.forename: Y Y
authors.initials: YY
authors.lastname: Wang
authors.forename: M
authors.initials: M
authors.lastname: Kawasaki
authors.forename: J
authors.initials: J
authors.lastname: Bruley
authors.forename: M
authors.initials: M
authors.lastname: Gribelyuk
authors.forename: A
authors.initials: A
authors.lastname: Domenicucci
authors.forename: J
authors.initials: J
authors.lastname: Gaudiello
mesh_terms: D003952:Diagnostic Imaging / Q000295:instrumentation* / Q000379:methods*; D006696:Holography / Q000295:instrumentation* / Q000379:methods*; D007909:Lenses; D008854:Microscopy, Electron / Q000295:instrumentation / Q000379:methods; D055095:Optics and Photonics; D012666:Semiconductors; D012825:Silicon / Q000737:chemistry
chemical_list: D012825:Silicon