title: Mechanism of [M + H]+ formation in photoionization mass spectrometry.
abstract: In this paper we examine the mechanism of [M + H]+ (henceforth MH+) formation by direct photoionization. Based on comparisons of the relative abundance of M+ and MH+ ions for photoionization of a variety of compounds M as vapor in air versus in different solvents, we conclude that the mechanism is M + hnu --> M+ + e- followed by the reaction M+ + S --> MH+ + S(-H). The principal evidence for molecular radical ion formation M+ followed by hydrogen atom abstraction from protic solvent S are: (1) Nearly exclusive formation of M+ for headspace ionization of M in air, (2) significant relative abundance of MH+ in the presence of protic solvents (e.g., CH3OH, H2O, c-hexane), but not in aprotic solvents (e.g., CCl4-), (3) observation of induced equilibrium oscillations in the abundance of MH+ and M+, and (4) correlation of the ratio of MH+/M+ to reaction length in the photoionization source. Thermodynamic models are advanced that explain the qualitative dependence of the MH+/M+ equilibrium ratio on the properties of solvent S and analyte M. Though the hydrogen abstraction reaction is endothermic in most cases, it is shown that the equilibrium constant is still expected to be much greater than unity in most of the cases studied due to the very slow reverse reaction involving the very low abundant MH+ and S(-H) species.
authors.affiliation: Syagen Technology, Inc., Tustin, California 92780, USA. jsyage@syagen.com
authors.forename: Jack A
authors.initials: JA
authors.lastname: Syage
mesh_terms: D000388:Air / Q000032:analysis*; D000393:Air Pollutants / Q000032:analysis / Q000737:chemistry*; D001274:Atmospheric Pressure; D004784:Environmental Monitoring / Q000379:methods*; D008832:Microchemistry / Q000379:methods; D010777:Photochemistry / Q000379:methods; D012997:Solvents / Q000737:chemistry; D019032:Spectrometry, Mass, Matrix-Assisted Laser Desorption-Ionization / Q000379:methods*; D015262:Xenobiotics / Q000032:analysis / Q000737:chemistry*
chemical_list: D000393:Air Pollutants; D012997:Solvents; D015262:Xenobiotics