title: Low-pressure organometallic chemical vapor deposition of indium nitride on titanium dioxide nanoparticles.
authors.affiliation: Department of Chemistry, Emory University, 1515 Dickey Drive, Atlanta, Georgia 30322, USA.
authors.forename: Jeng-Han
authors.initials: JH
authors.lastname: Wang
authors.forename: M C
authors.initials: MC
authors.lastname: Lin