title: Monolayer pattern evolution via substrate strain-mediated spinodal decomposition.
abstract: Investigations of octylsilane (C8H17SiH3) monolayer pattern formation on Au(111) are reported. Scanning tunneling microscopy data display the evolution of a approximately 6 nm scale pattern of interwoven features concomitant with ejection of surface Au atoms and relaxation of the Au(111) 23xsqrt[3] surface reconstruction. Numerical simulations suggest the surface dynamics are governed by a substrate strain-mediated spinodal decomposition mechanism, novel to organic monolayer formation. Collectively, the experimental and theoretical data indicate strain-inducing Si-Au bond interactions drive the pattern formation and the alkyl chains play a negligible role.
authors.affiliation: Chemistry Department, The University of Michigan, Ann Arbor, Michigan 48109-1055, USA.
authors.forename: Kevin S
authors.initials: KS
authors.lastname: Schneider
authors.forename: Wei
authors.initials: W
authors.lastname: Lu
authors.forename: Thomas M
authors.initials: TM
authors.lastname: Owens
authors.forename: Daniel R
authors.initials: DR
authors.lastname: Fosnacht
authors.forename: M M Banaszak
authors.initials: MM
authors.lastname: Holl
authors.forename: B G
authors.initials: BG
authors.lastname: Orr