Plasma surface modification of organic materials: comparison between polyethylene films and octadecyltrichlorosilane self-assembled monolayers.
Low-pressure low-frequency NH3 plasmas have been used for the surface modification of bulk polyethylene films and of octadecyltrichlorosilane (OTS) self-assembled monolayers deposited on oxidized silicon wafers. The incorporation of nitrogen-containing groups by the plasma treatment has been followed by contact angle measurements and by X-ray photoelectron spectroscopy. The surface degradation of the OTS monolayers due to plasma etching has been measured separately by optical ellipsometry with subnanometric accuracy. Our data show clear evidence for the existence of an optimum treatment time, yielding a high density of NH2 functional groups without significant variation of the structural features of the organic material. Self-assembled monolayers appear as excellent model systems to characterize the effects of plasma discharges on polyolefins. In particular, they allow testing the influence of molecular orientation, packing density, and crystallinity on the final results.
Tatoulian
M
M
Laboratoire de Physico Chimie Curie, Institut Curie, 11 rue Pierre et Marie Curie, 75005 Paris, France.
Bouloussa
O
O
Morière
F
F
Arefi-Khonsari
F
F
Amouroux
J
J
Rondelez
F
F
D000641:Ammonia / Q000737:chemistry*; D008567:Membranes, Artificial; D020959:Polyethylene / Q000737:chemistry*; D012680:Sensitivity and Specificity; D012821:Silanes / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry; D013052:Spectrometry, X-Ray Emission / Q000379:methods; D020349:Surface Plasmon Resonance / Q000379:methods*; D013499:Surface Properties; D013997:Time Factors; D017155:Wettability
D008567:Membranes, Artificial; D012821:Silanes; C061189:octadecyltrichlorosilane; D000641:Ammonia; D020959:Polyethylene; D012825:Silicon