Monolayer pattern evolution via substrate strain-mediated spinodal decomposition.
Investigations of octylsilane (C8H17SiH3) monolayer pattern formation on Au(111) are reported. Scanning tunneling microscopy data display the evolution of a approximately 6 nm scale pattern of interwoven features concomitant with ejection of surface Au atoms and relaxation of the Au(111) 23xsqrt[3] surface reconstruction. Numerical simulations suggest the surface dynamics are governed by a substrate strain-mediated spinodal decomposition mechanism, novel to organic monolayer formation. Collectively, the experimental and theoretical data indicate strain-inducing Si-Au bond interactions drive the pattern formation and the alkyl chains play a negligible role.
Schneider
Kevin S
KS
Chemistry Department, The University of Michigan, Ann Arbor, Michigan 48109-1055, USA.
Lu
Wei
W
Owens
Thomas M
TM
Fosnacht
Daniel R
DR
Holl
M M Banaszak
MM
Orr
B G
BG