Efficient control system for low-concentration inorganic gases from a process vent stream: application of surfactants in spray and packed columns.
Control of low-concentration pollutants from a semiconductor process vent stream using a wet-scrubbing technique is a challenging task to meet Taiwan environmental emission standards. An efficient wet-scrubber is designed on a pilot scale and tested to control low concentration acid and base waste-gas emission. The scrubber system consisted of two columns, i.e., a fine spray column [cutoff diameter (based on volume), Dv(50) = 15.63 microm; Sauter mean diameter (SMD) = 7.62 microm], which is especially efficient for NH3 removal as the pH of the spraying liquid is approximately 7 followed by a packed column with a scrubbing liquid pH approximately 9.0 mainly for acids removal. It is observed that use of the surfactants in low concentration about 10(-4) M and 10(-7) M in the spray liquid and in the scrubbing liquid, respectively, remarkably enhances the removal efficiency of the system. A traditional packed column (without the spray column and the surfactant) showed that the removal efficiencies of NH3, HF, and HCl for the inlet concentration range 0.2 to 3 ppm were (n = 5) 22.6+/-3.4%, 43.4+/-5.5%, and 40.4+/-7.4%, respectively. The overall efficiencies of the proposed system (the spray column and the packed column) in the presence of the surfactant in the spray liquid and in the scrubbing liquid forthese three species were found to increase significantly (n = 5) from 60.3+/-3.6 to 82.8+/-6.8%, 59.1+/-2.7 to 83.4+/-4.2%, and 56.2+/-7.3 to 81.0+/-6.7%, respectively. In this work, development of charge on the gas-liquid interface due to the surfactants has been measured and discussed. It is concluded that the presence of charge on the gas-liquid interface is the responsible factor for enhancement of the removal efficiency (mass-transfer in liquid phase). The effects of the type of surfactants, their chain length, concentration in liquid, etc. on the removal efficiency are discussed. Since the pilot tests were performed under the operating conditions similar to most of the wet-scrubbers operated in semiconductors manufacturing facilities for inorganic pollutants, this study can be applied to modify the existing wet-scrubbers to enhance the removal efficiencies, especially for low-concentration pollutants.
Chein
Hungmin
H
Environmental Nanotechnology Research Laboratory, Center for Environmental, Safety and Health Technology Development, Industrial Technology Research Institute, Chutung, Hsinchu, Taiwan 310. hmchein@itri.org.tw
Aggarwal
Shankar G
SG
Wu
Hsin-Hsien
HH
D000336:Aerosols / Q000737:chemistry; D000395:Air Pollutants, Occupational / Q000032:analysis*; D000641:Ammonia / Q000302:isolation & purification; D004787:Environmental Pollution / Q000517:prevention & control; D005740:Gases / Q000032:analysis*; D006851:Hydrochloric Acid / Q000302:isolation & purification; D006858:Hydrofluoric Acid / Q000302:isolation & purification; D006863:Hydrogen-Ion Concentration; D007287:Inorganic Chemicals / Q000032:analysis*; D012666:Semiconductors; D013501:Surface-Active Agents / Q000737:chemistry*; D013624:Taiwan; D014691:Ventilation / Q000379:methods*
D000336:Aerosols; D000395:Air Pollutants, Occupational; D005740:Gases; D007287:Inorganic Chemicals; D013501:Surface-Active Agents; D000641:Ammonia; D006851:Hydrochloric Acid; D006858:Hydrofluoric Acid