Analog micro-optics fabrication by use of a two-dimensional binary phase-grating mask.
The utilization of phase-mask technology for the fabrication of an analog micro-optics profile with a thick photoresist was investigated. A two-dimensional phase-grating mask with pi phase depth can produce a desired analog variation of exposure intensity, which allows one to vary the thickness of an analog photoresist after its exposure by a photolithographic stepper and development of the photoresist. A two-dimensional phase-grating mask of square pixels was simulated, designed, and fabricated. The fabrication of analog micro-optics in a thick SPR-220 photoresist by use of this phase mask was also demonstrated.
Sung
Jinwon
J
College of Optics and Photonics, CREOL & FPCE, University of Central Florida, Orlando, Florida 32816-2700, USA.
Hockel
Heidi
H
Johnson
Eric G
EG