Use of a self-etching adhesive on previously etched intact enamel and its effect on sealant microleakage and tag formation.
OBJECTIVE
This study verified the effects of a self-etching adhesive applied on pre-etched fissures (phosphoric acid 35%) on microleakage, penetration ability and tag formation of a fissure sealant.


METHODS
80 extracted sound human molar teeth were randomly divided into four groups and bisected in two equal parts, forming two subgroups, denominated A and B. Groups 1 and 2 were etched with phosphoric acid for 60 and 40s, respectively. Groups 3 and 4 were etched with phosphoric acid (40 and 20s, respectively) and afterwards treated with Xeno III (20s). All the procedures on sealant placement were performed under 90+/-2% relative humidity. The subgroups A and B were submitted to 1000 and 5000 thermal cycles, respectively. The samples were examined by light microscopy and by confocal laser scanning microscopy (CLSM) after sectioning. Microleakage, penetration ability, fissure type, tag formation quality and tag length were measured.


RESULTS
Etching with phosphoric acid for 60s showed statistically significantly lower microleakage when compared to the other groups and significantly better tag formation quality and longer tags compared to 20s H(3)PO(4) plus Xeno III. Fissure type and number of thermal cycles were not significant factors on sealant microleakage. The penetration ability of the sealant in the fissure systems was not influenced by the treatment regimes. Shallow fissures showed a significant better tag formation than deep fissures. No significant difference in the prevalence of fissure types was seen among the groups.


CONCLUSIONS
Etching fissures with phosphoric acid for 60s showed best results. The additional use of Xeno III did not improve fissure sealing under the conditions of this study.
Celiberti
Paula
P
Department of Operative, Preventive and Pediatric Dentistry, School of Dental Medicine, University of Bern, Freiburgstrasse 7, 3010 Bern, Switzerland. paulaceliberti@hotmail.com
Lussi
Adrian
A
D000134:Acid Etching, Dental; D001840:Dental Bonding; D003743:Dental Enamel / Q000648:ultrastructure*; D003763:Dental Leakage / Q000145:classification*; D017220:Dentin-Bonding Agents / Q000737:chemistry*; D005456:Fluorescent Dyes; D006801:Humans; D006813:Humidity; D018613:Microscopy, Confocal; D010756:Phosphoric Acids / Q000737:chemistry; D010895:Pit and Fissure Sealants / Q000737:chemistry*; D013499:Surface Properties; D013696:Temperature; D013997:Time Factors
D017220:Dentin-Bonding Agents; D005456:Fluorescent Dyes; D010756:Phosphoric Acids; D010895:Pit and Fissure Sealants; C487957:Xeno III