Stark broadening experiments on a vacuum arc discharge in tin vapor.
Pinched discharge plasmas in tin vapor are candidates for application in future semiconductor lithography tools. This paper presents time-resolved measurements of Stark broadened linewidths in a pulsed tin discharge. Stark broadening parameters have been determined for four lines of the Sn III spectrum in the range from 522 to 538 nm, based on a cross-calibration to a Sn II line with a previously known Stark width. The influence of the electron temperature on the Stark widths is discussed. Results for the electron densities in the discharge are presented and compared to Thomson scattering results.
Kieft
E R
ER
Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands. e.r.kieft@tue.nl
van der Mullen
J J A M
JJ
Kroesen
G M W
GM
Banine
V
V
Koshelev
K N
KN