Waveguide sidewall roughness measurement on full wafers by SEM-based stereoscopy.
We present a technique aiming at sidewall roughness measurement on integrated optical silica waveguides using a scanning electron microscope. The technique uses the principles of stereoscopy to retrieve sidewall topography. Practical implementation details and first results are provided.
Bony
A
A
Laboratory of Photonic Systems, Parc d'innovation, Bld S. Brant 67400 Illkirch, France. alexis.bony@sphot.u-strabsg.fr
Heid
A
A
Takakura
Y
Y
Satzke
K
K
Meyrueis
P
P