title: Photon-sieve lithography.
abstract: We present the first lithography results that use high-numerical-aperture photon sieves as focusing elements in a scanning-optical-beam-lithography system [J. Vac. Sci. Technol. B 21, 2810 (2003)]. Photon sieves are novel optical elements that offer the advantages of higher resolution and improved image contrast compared with traditional diffractive optics such as zone plates [Nature 414, 184 (2001)]. We fabricated the highest-numerical-aperture photon sieves reported to date and experimentally verified their focusing characteristics. We propose two new designs of the photon sieve that have the potential to significantly increase focusing efficiency.
authors.affiliation: Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA. rmenon@nano.mit.edu
authors.forename: Rajesh
authors.initials: R
authors.lastname: Menon
authors.forename: Dario
authors.initials: D
authors.lastname: Gil
authors.forename: George
authors.initials: G
authors.lastname: Barbastathis
authors.forename: Henry I
authors.initials: HI
authors.lastname: Smith