title: In situ synchrotron X-ray studies of ferroelectric thin films.
abstract: In situ synchrotron X-ray scattering was used to observe both the growth of PbTiO3 films by metal-organic chemical vapour deposition and the behaviour of the ferroelectric phase transition as a function of film thickness. The dependences of growth mode and deposition rate on gas flows and substrate temperature were determined by homoepitaxial growth studies on thick films (>50 nm). These studies facilitated the growth of thin coherently strained PbTiO3 films on SrTiO3 (001) substrates, with thicknesses ranging from 2 to 42 nm. Experiments on the ferroelectric phase transition as a function of film thickness were carried out in these films under controlled mechanical and electrical boundary conditions.
authors.affiliation: Argonne National Laboratory, 9700 South Cass Avenue, Argonne, IL 60439, USA.
authors.forename: D D
authors.initials: DD
authors.lastname: Fong
authors.forename: J A
authors.initials: JA
authors.lastname: Eastman
authors.forename: G B
authors.initials: GB
authors.lastname: Stephenson
authors.forename: P H
authors.initials: PH
authors.lastname: Fuoss
authors.forename: S K
authors.initials: SK
authors.lastname: Streiffer
authors.forename: Carol
authors.initials: C
authors.lastname: Thompson
authors.forename: O
authors.initials: O
authors.lastname: Auciello