title: Waveguide sidewall roughness measurement on full wafers by SEM-based stereoscopy.
abstract: We present a technique aiming at sidewall roughness measurement on integrated optical silica waveguides using a scanning electron microscope. The technique uses the principles of stereoscopy to retrieve sidewall topography. Practical implementation details and first results are provided.
authors.affiliation: Laboratory of Photonic Systems, Parc d'innovation, Bld S. Brant 67400 Illkirch, France. alexis.bony@sphot.u-strabsg.fr
authors.forename: A
authors.initials: A
authors.lastname: Bony
authors.forename: A
authors.initials: A
authors.lastname: Heid
authors.forename: Y
authors.initials: Y
authors.lastname: Takakura
authors.forename: K
authors.initials: K
authors.lastname: Satzke
authors.forename: P
authors.initials: P
authors.lastname: Meyrueis