title: Ultra-high vacuum scanning tunneling microscopy and theoretical studies of 1-halohexane monolayers on graphite.
abstract: A simple model system for the 2D self-assembly of functionalized organic molecules on surfaces was examined in a concerted experimental and theoretical effort. Monolayers of 1-halohexanes were formed through vapor deposition onto graphite surfaces in ultrahigh vacuum. Low-temperature scanning tunneling microscopy allowed the molecular conformation, orientation, and monolayer crystallographic parameters to be determined. Essentially identical noncommensurate monolayer structures were found for all 1-halohexanes, with differences in image contrast ascribed mainly to electronic factors. Energy minimizations and molecular dynamics simulations reproduced structural parameters of 1-bromohexane monolayers quantitatively. An analysis of interactions driving the self-assembly process revealed the crucial role played by small but anisotropic electrostatic forces associated with the halogen substituent. While alkyl chain dispersion interactions drive the formation of a close-packed adsorbate monolayer, electrostatic headgroup forces are found to compete successfully in the control of both the angle between lamella and backbone axes and the angle between surface and backbone planes. This competition is consistent with energetic tradeoffs apparent in adsorption energies measured in earlier temperature-programmed desorption studies. In accordance with the higher degree of disorder observed in scanning tunneling microscopy images of 1-fluorohexane, theoretical simulations show that electrostatic forces associated with the fluorine substituent are sufficiently strong to upset the delicate balance of interactions required for the formation of an ordered monolayer. The detailed dissection of the driving forces for self-assembly of these simple model systems is expected to aid in the understanding of the more complex self-assembly processes taking place in the presence of solvent.
authors.affiliation: Department of Chemistry and Columbia Materials Research Science and Engineering Center, Columbia University, New York, NY 10027, USA.
authors.forename: Thomas
authors.initials: T
authors.lastname: Müller
authors.forename: Tova L
authors.initials: TL
authors.lastname: Werblowsky
authors.forename: Gina M
authors.initials: GM
authors.lastname: Florio
authors.forename: Bruce J
authors.initials: BJ
authors.lastname: Berne
authors.forename: George W
authors.initials: GW
authors.lastname: Flynn