title: [Method to measure spectrum intensity from laser plasma soft X-ray source].
abstract: This paper presents a method to detect and measure spectrum intensity from a laser plasma soft X-ray source. A Channel Electron Multiplier (CEM) and a calibrated silicon photodiode were used as detectors in this method, the former is a nonstandard detector and the latter is a standard one. Charge-sensitive preamplifiers were used for measuring total charges generated by detectors, and a monochromator with high resolution was employed as the spectrometer. The formulae to calculate spectrum intensity from laser plasma soft X-ray source was given, based on the known grating efficiency of the monochromator, CEM's gain and responsivity of the silicon photodiode to photons.
authors.affiliation: State Key Lab of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130022, China.
authors.forename: Qi-liang
authors.initials: QL
authors.lastname: Ni
authors.forename: Yan
authors.initials: Y
authors.lastname: Gong
authors.forename: Bo
authors.initials: B
authors.lastname: Chen
authors.forename: Jian-lin
authors.initials: JL
authors.lastname: Cao
mesh_terms: D004867:Equipment Design; D007834:Lasers; D011857:Radiographic Image Interpretation, Computer-Assisted / Q000379:methods*; D012815:Signal Processing, Computer-Assisted / Q000295:instrumentation; D012825:Silicon / Q000737:chemistry; D013057:Spectrum Analysis / Q000379:methods*; D014057:Tomography, X-Ray Computed / Q000379:methods*; D014965:X-Rays
chemical_list: D012825:Silicon