title: Chemical and thermal stability of alkanethiol and sulfur passivated InP(100).
abstract: InP(100) surfaces treated with Na2Sx9H20 and CnH(2n+1)SH are examined by contact angle measurement, X-ray photoelectron spectroscopy, and atomic force microscopy to determine the chemical and thermal behavior of these passivated surfaces. The surfaces coated by octadecanethiol (n = 18) self-assembled monolayers (SAMs) are found to be more stable toward oxidation than the S-passivated surface. The chemical stability of octadecanethiol SAMs in various environments is examined. The thiol monolayer is found to be stable in 0.1 M HCl but degrades in 0.1 M NaOH, boiling chloroform, and water. The behavior of these surfaces at elevated temperatures under a vacuum is also investigated. The octadecanethiol-coated InP(100) is stable up to 473 K, above which the films begin to degrade. Unlike other substrates on which the entire molecule including the sulfur headgroup desorbs together, on InP, the sulfur headgroup remains on the surface even after annealing to 673 K. These observations suggest that the desorption occurs by S-C bond cleavage as well as In-S bond cleavage. The sulfur of S-passivated InP is found to be more thermally stable than that of the octadecanethiol monolayer, perhaps due to their different bonding geometries and hence energies.
authors.affiliation: Department of Chemical Engineering, University of California, Berkeley, California 94720, USA.
authors.forename: Hyuneui
authors.initials: H
authors.lastname: Lim
authors.forename: Carlo
authors.initials: C
authors.lastname: Carraro
authors.forename: Roya
authors.initials: R
authors.lastname: Maboudian
authors.forename: Marcel W
authors.initials: MW
authors.lastname: Pruessner
authors.forename: Reza
authors.initials: R
authors.lastname: Ghodssi