title: Cross-linked polymer replica of a nanoimprint mold at 30 nm half-pitch.
abstract: This letter reports the demonstration of a photocurable polymer process for replicating the master mold for nanoimprint lithography. The cross-linked polymer mold was fabricated directly with high fidelity from a master by imprinting and photocuring a low viscosity liquid prepolymer film spun onto a substrate. The surface of the cross-linked polymer mold can be treated using an O(2) plasma, and then vapor primed with a low surface energy mold release layer for repeatable imprinting. The imprinting results demonstrated that the cross-linked polymer mold could be faithfully used for both thermal and photocurable nanoimprint lithography.
authors.affiliation: Hewlett-Packard Laboratories, Palo Alto, California 94304, USA.
authors.forename: Haixiong
authors.initials: H
authors.lastname: Ge
authors.forename: Wei
authors.initials: W
authors.lastname: Wu
authors.forename: Zhiyong
authors.initials: Z
authors.lastname: Li
authors.forename: Gun-Young
authors.initials: GY
authors.lastname: Jung
authors.forename: Deirdre
authors.initials: D
authors.lastname: Olynick
authors.forename: Yanfeng
authors.initials: Y
authors.lastname: Chen
authors.forename: J Alexander
authors.initials: JA
authors.lastname: Liddle
authors.forename: Shih-Yuan
authors.initials: SY
authors.lastname: Wang
authors.forename: R Stanley
authors.initials: RS
authors.lastname: Williams