title: Conductive atomic force microscope nanopatterning of hydrogen-passivated silicon in inert organic solvents.
abstract: Ambient liquid phase atomic force microscope (AFM) techniques for nanopatterning organic molecules on silicon through direct Si-C bonds rely on reactions that are in direct competition with spurious oxidation. We study the effectiveness of an inert hydrophobic organic solvent at suppressing oxidation of hydrogen-passivated silicon under ambient conditions. Nanometer scale features were fabricated on an H:Si(111) substrate using a conductive AFM in hexadecane. The patterned features show chemical and kinetic behavior consistent with field induced oxidation (FIO) in air. The mechanism for FIO in hexadecane is discussed.
authors.affiliation: Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA.
authors.forename: C Reagan
authors.initials: CR
authors.lastname: Kinser
authors.forename: Matthew J
authors.initials: MJ
authors.lastname: Schmitz
authors.forename: Mark C
authors.initials: MC
authors.lastname: Hersam