Photoinduced cleavage of alkyl monolayers on Si.
Shirahata
Naoto
N
Department of Applied Chemistry, Graduate School of Engineering, Nagoya University, Furo-cho, Nagoya 464-8603, Japan. n-shirahata@aist.go.jp
Yonezawa
Tetsu
T
Seo
Won-Seon
WS
Koumoto
Kunihito
K