Cross-linked polymer replica of a nanoimprint mold at 30 nm half-pitch.
This letter reports the demonstration of a photocurable polymer process for replicating the master mold for nanoimprint lithography. The cross-linked polymer mold was fabricated directly with high fidelity from a master by imprinting and photocuring a low viscosity liquid prepolymer film spun onto a substrate. The surface of the cross-linked polymer mold can be treated using an O(2) plasma, and then vapor primed with a low surface energy mold release layer for repeatable imprinting. The imprinting results demonstrated that the cross-linked polymer mold could be faithfully used for both thermal and photocurable nanoimprint lithography.
Ge
Haixiong
H
Hewlett-Packard Laboratories, Palo Alto, California 94304, USA.
Wu
Wei
W
Li
Zhiyong
Z
Jung
Gun-Young
GY
Olynick
Deirdre
D
Chen
Yanfeng
Y
Liddle
J Alexander
JA
Wang
Shih-Yuan
SY
Williams
R Stanley
RS