title: Effect of bending and torsional mode excitation on the reaction Cl+CH4-->HCl+CH3.
abstract: A beam containing CH(4), Cl(2), and He is expanded into a vacuum chamber where CH(4) is prepared via infrared excitation in a combination band consisting of one quantum of excitation each in the bending and torsional modes (nu(2)+nu(4)). The reaction is initiated by fast Cl atoms generated by photolysis of Cl(2) at 355 nm, and the resulting CH(3) and HCl products are detected in a state-specific manner using resonance-enhanced multiphoton ionization (REMPI). By comparing the relative amplitudes of the action spectra of Cl+CH(4)(nu(2)+nu(4)) and Cl+CH(4)(nu(3)) reactions, we determine that the nu(2)+nu(4) mode-driven reaction is at least 15% as reactive as the nu(3) (antisymmetric stretch) mode-driven reaction. The REMPI spectrum of the CH(3) products shows no propensity toward the formation of umbrella bend mode excited methyl radical, CH(3)(nu(2)=1), which is in sharp distinction to the theoretical expectation based on adiabatic correlations between CH(4) and CH(3). The rotational distribution of HCl(v=1) products from the Cl+CH(4)(nu(2)+nu(4)) reaction is hotter than the corresponding distribution from the Cl+CH(4)(nu(3)) reaction, even though the total energies of the two reactions are the same within 4%. An explanation for this enhanced rotational excitation of the HCl product from the Cl+CH(4)(nu(2)+nu(4)) reaction is offered in terms of the projection of the bending motion of the CH(4) reagent onto the rotational motion of the HCl product. The angular distributions of the HCl(nu=0) products from the Cl+CH(4)(nu(2)+nu(4)) reaction are backward scattered, which is in qualitative agreement with theoretical calculation. Overall, nonadiabatic product vibrational correlation and mode specificity of the reaction indicate that either the bending mode or the torsional mode or both modes are strongly coupled to the reaction coordinate.
authors.affiliation: Department of Chemistry, Stanford University, Stanford, CA 94305-5080, USA.
authors.forename: Zee Hwan
authors.initials: ZH
authors.lastname: Kim
authors.forename: Hans A
authors.initials: HA
authors.lastname: Bechtel
authors.forename: Jon P
authors.initials: JP
authors.lastname: Camden
authors.forename: Richard N
authors.initials: RN
authors.lastname: Zare