Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography.
This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices.
Mendes
Paula M
PM
School of Chemistry, University of Birmingham, Edgbaston, Birmingham B15 2TT, United Kingdom.
Jacke
Susanne
S
Critchley
Kevin
K
Plaza
Jose
J
Chen
Yu
Y
Nikitin
Kirill
K
Palmer
Richard E
RE
Preece
Jon A
JA
Evans
Stephen D
SD
Fitzmaurice
Donald
D