title: Gold nanoparticle patterning of silicon wafers using chemical e-beam lithography.
abstract: This paper demonstrates a novel facile method for fabrication of patterned arrays of gold nanoparticles on Si/SiO2 by combining electron beam lithography and self-assembly techniques. Our strategy is to use direct-write electron beam patterning to convert nitro functionality in self-assembled monolayers of 3-(4-nitrophenoxy)-propyltrimethoxysilane to amino functionality, forming chemically well-defined surface architectures on the 100 nm scale. These nanopatterns are employed to guide the assembly of citrate-passivated gold nanoparticles according to their different affinities for amino and nitro groups. This kind of nanoparticle assembly offers an attractive new option for nanoparticle patterning a silicon surface, as relevant, for example, to biosensors, electronics, and optical devices.
authors.affiliation: School of Chemistry, University of Birmingham, Edgbaston, Birmingham B15 2TT, United Kingdom.
authors.forename: Paula M
authors.initials: PM
authors.lastname: Mendes
authors.forename: Susanne
authors.initials: S
authors.lastname: Jacke
authors.forename: Kevin
authors.initials: K
authors.lastname: Critchley
authors.forename: Jose
authors.initials: J
authors.lastname: Plaza
authors.forename: Yu
authors.initials: Y
authors.lastname: Chen
authors.forename: Kirill
authors.initials: K
authors.lastname: Nikitin
authors.forename: Richard E
authors.initials: RE
authors.lastname: Palmer
authors.forename: Jon A
authors.initials: JA
authors.lastname: Preece
authors.forename: Stephen D
authors.initials: SD
authors.lastname: Evans
authors.forename: Donald
authors.initials: D
authors.lastname: Fitzmaurice