title: Planar thin film device for capillary electrophoresis.
abstract: Hollow tubular microfluidic channels were fabricated on quartz substrates using sacrificial layer, planar micromachining processes. The channels were created using a bottom-up fabrication technique, namely patterning a photoresist/aluminum sacrificial layer and depositing SiO(2) over the substrate. The photoresist/aluminum layer was removed by etching first with HCl/HNO(3), followed by etching in Nano-Strip, a more stable form of piranha (H(2)SO(4)/H(2)O(2)) stripper. Rapid separation of fluorescently labeled amino acids was performed on a device made with these channels. The fabrication process presented here provides unique control over channel composition and geometry. Future work should allow the fabrication of highly complex and precise devices with integrated analytical capabilities essential for the development of micro-total analysis systems.
authors.affiliation: Department of Electrical and Computer Engineering, Brigham Young University, Provo, UT 84602, USA.
authors.forename: B A
authors.initials: BA
authors.lastname: Peeni
authors.forename: D B
authors.initials: DB
authors.lastname: Conkey
authors.forename: J P
authors.initials: JP
authors.lastname: Barber
authors.forename: R T
authors.initials: RT
authors.lastname: Kelly
authors.forename: M L
authors.initials: ML
authors.lastname: Lee
authors.forename: A T
authors.initials: AT
authors.lastname: Woolley
authors.forename: A R
authors.initials: AR
authors.lastname: Hawkins
mesh_terms: D000143:Acids / Q000737:chemistry; D000535:Aluminum / Q000737:chemistry; D019075:Electrophoresis, Capillary / Q000295:instrumentation*; D004867:Equipment Design / Q000379:methods; D008567:Membranes, Artificial; D044085:Microfluidics / Q000295:instrumentation; D011791:Quartz / Q000737:chemistry; D012680:Sensitivity and Specificity; D012822:Silicon Dioxide / Q000737:chemistry; D013499:Surface Properties; D013997:Time Factors
chemical_list: D000143:Acids; D008567:Membranes, Artificial; D011791:Quartz; D012822:Silicon Dioxide; D000535:Aluminum