Assembly of colloidal particles by evaporation on surfaces with patterned hydrophobicity.
Drops containing suspended particles are placed on surfaces of patterned wettability created using soft lithography; the drop diameter is large compared to the dimensions of the patterns on the substrate. As the three-phase contact line of the drop recedes, spontaneous dewetting of the hydrophobic domains and flow into the hydrophilic domains create discrete fluid elements with peripheries that can mimic the underlying surface topography. Suspended particles are carried with the fluid into the wetted regions and deposit there as the discrete fluid domains evaporate. If particle volume fractions are sufficiently high, the entire wetted domain can be covered with colloidal crystals. At lower volume fractions, flow within the evaporating fluid element can direct the deposition of colloidal particles at the peripheries of the domains. High-resolution arrays of particles were obtained with a variety of features depending upon the relative size of the wetting regions to the particles. When the wetting region is larger than the particles, three-dimensional and two-dimensional arrays of ordered particles mimicking the shape of the wetting pattern form, depending on the particle volume fraction. For lower volume fractions, one-dimensional (1-D) arrays along the wet/non-wet boundaries form. When the particle size is similar to the height of fluid on the wetted domain, zero-dimensional distributions of single particles centered in the wet regions can form for wetted squares or 1-D distributions (stripes) form along the axis of striped domains. Finally, when the wetting region is smaller than the particle size, the particles do not deposit within the features but are drawn backward with the receding drop. These results indicate that evaporation on surfaces of patterned wetting provides a highly parallelizable means of tailoring the geometry of particle distributions to create patterned media.
Fan
Fengqiu
F
Department of Chemical & Biomolecular Engineering, Johns Hopkins University, Baltimore, Maryland 21218, USA.
Stebe
Kathleen J
KJ