title: The effects of network structure on the resistance of silane coupling agent layers to water-assisted crack growth.
abstract: Silane adhesion promoters are commonly used to improve the adhesion, durability, and corrosion resistance of polymer-oxide interfaces. The current study investigates a model interface consisting of the natural oxide of(100) Si and an epoxy cured from diglycidyl ether ofbisphenol A (DGEBA) and triethylenetetraamine (TETA). The thickness of (3-glycidoxypropyl)trimethoxysilane (GPS) films placed between the two materials provided the structural variable. Five surface treatments were investigated: a bare interface, a rough monolayer film, a smooth monolayer film, a 5 nm thick film, and a 10 nm thick film. Previous neutron reflection experiments revealed large extension ratios (>2) when the 5 and 10 nm thick GPS films were exposed to deuterated nitrobenzene vapor. Despite the larger extension ratio for the 5 nm thick film, the epoxy/Si fracture energy (Gc) was equal to that of the 10 nm thick film under ambient conditions. Even the smooth monolayer exhibited the same Gc. Only when the monolayer included a significant number of agglomerates did the Gc drop to levels closer to that of the bare interface. When immersed in water at room temperature for 1 week, the threshold energy release rate (Gth) was nearly equal to Gc for the smooth monolayer, 5 nm thick film, and 10 nm thick film. While the Gth for all three films decreased with increasing water temperature, the Gth of the smooth monolayer decreased more rapidly. The bare interface was similarly sensitive to temperature; however, the Gth of the rough monolayer did not change significantly as the temperature was raised. Despite the influence of pH on hydrolysis, the Gth was insensitive to the pH of the water for all surface treatments.
authors.affiliation: Materials Department, University of California, Santa Barbara, Santa Barbara, California 93106, USA.
authors.forename: J J
authors.initials: JJ
authors.lastname: Benkoski
authors.forename: E J
authors.initials: EJ
authors.lastname: Kramer
authors.forename: H
authors.initials: H
authors.lastname: Yim
authors.forename: M S
authors.initials: MS
authors.lastname: Kent
authors.forename: J
authors.initials: J
authors.lastname: Hall