Modal focusing effect of positive and negative ions by a three-dimensional plasma-sheath lens.
A complex focusing effect of positive and negative ions caused by the sheath forming to biased electrodes that interface insulators has been found by solving in three dimensions the potential distribution and ion kinetics within the sheath. Thus, intrinsically correlated with the sheath shape, certain electrical charges are focused on the surface, forming well defined patterns named modal lines and modal spots. Their superposition to the previously reported discrete focusing leads to a total flux that represents a "fingerprint" of the entire sheath on the electrode surface. The ion flux pattern is developed experimentally on the surface of square and octagonal electrodes exposed to Ar/SF(6) and CF4 plasmas. Present results are of high potential importance for fundamental studies concerning sheath formation and charge kinetics and also in a wide range of plasma applications.
Stamate
E
E
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan.
Sugai
H
H