title: Fabrication of photosensitive multilayer films based on polyoxometalate and diazoresin.
abstract: A novel photosensitive organic-inorganic composite film incorporating polyoxometalate, K7[SiW11O39Co(H3P2O7)] (SiW11CoPP), and diazoresin (DR) has been prepared via layer-by-layer (LBL) self-assembly. Under UV irradiation, followed the decomposition of diazonium in DR, the ionic bonds between the adjacent interfaces of the multilayer film convert to covalent bonds. The LBL multilayers were characterized by UV-vis spectroscopy, X-ray photoelectron spectra (XPS), atomic force microscopy (AFM), FTIR spectrum, cyclic voltammograms (CV), and electron spin resonance (ESR) measurements. UV spectroscopy shows that the deposition process is regular and highly reproducible from layer to layer. XPS spectra confirm the incorporation of DR and SiW(11)CoPP into the films. Atomic force microscopy image indicates that the film surface is uniform and smooth. Solvent etching experiment proves that the film has significant stability towards polar solvent. Electrochemical behavior of the multilayers is investigated.
authors.affiliation: Institute of Polyoxometalate Chemistry, Faculty of Chemistry, Northeast Normal University, Changchun 130024, People's Republic of China.
authors.forename: Yuhua
authors.initials: Y
authors.lastname: Feng
authors.forename: Jun
authors.initials: J
authors.lastname: Peng
authors.forename: Zhangang
authors.initials: Z
authors.lastname: Han
authors.forename: Huiyuan
authors.initials: H
authors.lastname: Ma