title: Nanoscale patterning of Zr-Al-Cu-Ni metallic glass thin films deposited by magnetron sputtering.
abstract: Completely glassy thin films of Zr-Al-Cu-Ni exhibiting a large super-cooled liquid region (deltaTx = 95 K), very smooth surface (Ra = 0.65 nm), and an extremely high value of Vicker's hardness (Hv = 940), as compared to bulk Zr-Al-Cu-Ni metallic glass, were deposited by radiofrequency magnetron sputtering. Nanoscale patterning ability of Zr-Al-Cu-Ni metallic glass thin films was demonstrated by a focused ion beam etching. The capability to write nanometer-scale patterns (line width approximately 12 nm) opens up a variety of possibilities for fabricating nanomolds for imprint lithography, and a wide range of two- or three-dimensional components for future nanoelectromechanical systems.
authors.affiliation: Japan Science and Technology Agency, Sendai 980-8577, Japan.
authors.forename: Parmanand
authors.initials: P
authors.lastname: Sharma
authors.forename: Wei
authors.initials: W
authors.lastname: Zhang
authors.forename: Kenji
authors.initials: K
authors.lastname: Amiya
authors.forename: Hisamichi
authors.initials: H
authors.lastname: Kimura
authors.forename: Akihisa
authors.initials: A
authors.lastname: Inoue
mesh_terms: D000535:Aluminum / Q000737:chemistry*; D003300:Copper / Q000737:chemistry*; D003460:Crystallization / Q000379:methods*; D005898:Glass / Q000737:chemistry; D008280:Magnetics; D008420:Manufactured Materials / Q000032:analysis; D008422:Materials Testing; D008567:Membranes, Artificial; D008670:Metals / Q000737:chemistry; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000295:instrumentation / Q000379:methods; D009532:Nickel / Q000737:chemistry*; D013499:Surface Properties; D015040:Zirconium / Q000737:chemistry*
chemical_list: D008567:Membranes, Artificial; D008670:Metals; D003300:Copper; D009532:Nickel; D015040:Zirconium; D000535:Aluminum