title: Self-assembled Gemini surfactant film-mediated dispersion stability.
abstract: The force-distance curves of 12-2-12 and 12-4-12 Gemini quaternary ammonium bromide surfactants on mica and silica surfaces obtained by atomic force microscopy (AFM) were correlated with the structure of the adsorption layer. The critical micelle concentration was measured in the presence or absence of electrolyte. The electrolyte effect (the decrease of CMC) is significantly more pronounced for Gemini than for single-chain surfactants. The maximum compressive force, F(max), of the adsorbed surfactant aggregates was determined. On the mica surface in the presence of 0.1 M NaCl, the Gemini micelles and strong repulsive barrier appear at surfactant concentrations 0.02-0.05 mM, which is significantly lower than that for the single C(12)TAB (5-10 mM). This difference between single and Gemini surfactants can be explained by a stronger adsorption energy of Gemini surfactants. The low concentration of Gemini at which this surfactant forms the strong micellar layer on the solid/solution interface proves that Gemini aggregates (micelles) potentially act as dispersing agent in processes such as chemical mechanical polishing or collector in flotation. The AFM force-distance results obtained for the Gemini surfactants were used along with turbidity measurements to determine how adsorption of Gemini surfactants affects dispersion stability. It has been shown that Gemini (or two-chain) surfactants are more effective dispersing agents, and that in the presence of electrolyte, the silica dispersion stability at pH 4.0 can also be achieved at very low surfactant concentrations ( approximately 0.02 mM).
authors.affiliation: Engineering Research Center for Particle Science and Technology, University of Florida, Gainesville, FL 32611, USA.
authors.forename: Y I
authors.initials: YI
authors.lastname: Rabinovich
authors.forename: J R
authors.initials: JR
authors.lastname: Kanicky
authors.forename: S
authors.initials: S
authors.lastname: Pandey
authors.forename: H
authors.initials: H
authors.lastname: Oskarsson
authors.forename: K
authors.initials: K
authors.lastname: Holmberg
authors.forename: B M
authors.initials: BM
authors.lastname: Moudgil
authors.forename: D O
authors.initials: DO
authors.lastname: Shah