title: Focused ion beam-nanomachined probes for improved electric force microscopy.
abstract: Nanomachining and beam-assisted Pt deposition by a focused ion beam (FIB) was used to modify AFM probes for improved electric force measurements. Si(3)N(4) cantilevers have been endowed with a nano-electrode at the tip apex to confine the electro-sensitive area at the very tip. This action results in both a marked decrease of the parasitic capacitive effect and in an improved electric force microscopy (EFM) contrast and resolution, with respect to usual, full metal-coated cantilevers. This fabrication approach is suited to the development of innovative electro-sensitive probes, useful in different scanning probe techniques.
authors.affiliation: INFM National Research Center S3, Via Campi 213/A, 41100 Modena, Italy.
authors.forename: Claudia
authors.initials: C
authors.lastname: Menozzi
authors.forename: Gian
authors.initials: G
authors.lastname: Carlo Gazzadi
authors.forename: Andrea
authors.initials: A
authors.lastname: Alessandrini
authors.forename: Paolo
authors.initials: P
authors.lastname: Facci