title: Estimation of diffusion parameters in functionalized silicas with modulated porosity. Part I: chromatographic studies.
abstract: The diffusion parameters of binary gas mixture He (tracer gas)-N2 (carrier gas) in hybrid organic-inorganic SiO2-X porous solids which have suffered gradual functionalization with functional groups X of increasing length (X = psi, [triple bond]Si-H, [triple bond]Si-CH2OH, [triple bond]Si-(CH2)3OH, [triple bond]Si-(CH2)11CH3) are reported. The effective diffusivities Deff, the Henry law constants K as well as the tortuosity factors tau for the examined solids were estimated by a typical pulse gas chromatographic method. Analysis of the experimental results was carried out by the well-known method of linearization of moments. The moments s analysis provides a powerful means for extracting diffusion parameters from the experimental response curves The proposed methodology is simple compared to other similar studies and provides rapidly reliable data. The results of this work indicate that the effective diffusivity Deff in porous networks drops markedly as the initial porosity of the parent SiO2 sample is blocked by the functionalization of the pore surfaces with functional groups of increasing size, [triple bond]Si-H, [triple bond]Si-CH2OH, [triple bond]Si-(CH2)3OH and [triple bond]Si-(CH2)11CH3. The low values of the Henry law constants K found indicate that the adsorption of He on the porous surfaces for all the solids is weak. Also, the tortuosity factor r is proportionally correlated to the pore blocking effects and the percolation phenomena of gases flowing into the porous network.
authors.affiliation: Department of Chemistry, University of Ioannina, Dourouti, Ioannina 45 110, Greece.
authors.forename: G S
authors.initials: GS
authors.lastname: Armatas
authors.forename: D E
authors.initials: DE
authors.lastname: Petrakis
authors.forename: P J
authors.initials: PJ
authors.lastname: Pomonis
mesh_terms: D000327:Adsorption; D002849:Chromatography, Gas / Q000379:methods*; D004058:Diffusion; D005740:Gases / Q000737:chemistry*; D006371:Helium / Q000737:chemistry; D008433:Mathematics; D009584:Nitrogen / Q000737:chemistry; D012822:Silicon Dioxide / Q000737:chemistry*
chemical_list: D005740:Gases; D006371:Helium; D012822:Silicon Dioxide; D009584:Nitrogen