Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition.
del Campo
Aránzazu
A
Max-Planck-Institut für Polymerforschung, Ackermannweg 10, 55128 Mainz, Germany.
Boos
Diana
D
Spiess
Hans Wolfgang
HW
Jonas
Ulrich
U
D001665:Binding Sites; D018625:Microscopy, Atomic Force / Q000379:methods; D015394:Molecular Structure; D010316:Particle Size; D012680:Sensitivity and Specificity; D012821:Silanes / Q000138:chemical synthesis / Q000737:chemistry* / Q000528:radiation effects*; D013499:Surface Properties; D014466:Ultraviolet Rays
D012821:Silanes