title: Self-assembly patterning of silica colloidal crystals.
abstract: We developed a self-assembly process of silica particles to fabricate desired patterns of colloidal crystals having high feature edge acuity and high regularity. A micropattern of colloidal methanol prepared on a self-assembled monolayer in hexane was used as a mold for particle patterning, and slow dissolution of methanol into hexane caused shrinkage of molds to form micropatterns of close-packed SiO2 particle assemblies. This result is a step toward the realization ofnano/micro periodic structures for next-generation photonic devices by a self-assembly process.
authors: Department of Applied Chemistry, Koumoto Laboratory, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan. masuda@apchem.nagoya-u.ac.jp
authors: Yoshitake
authors: Y
authors: Masuda
authors: Tetsuya
authors: T
authors: Itoh
authors: Kunihito
authors: K
authors: Koumoto