Single etch patterning of stacked silver and molybdenum alloy layers on glass using microcontact wave printing.
Stacked thin layers of silver alloy (AgPdCu) and MoCr layers on 10 x 15 cm2 glass substrates were patterned by microcontact wave printing and etching. Patterns of etch-resistant octadecanethiol self-assembled monolayers (SAMs) were wave printed with regular backplane stabilized PDMS stamps. Pattern development was achieved by etching both metal layers in a single step, employing a nitric acid-based etching bath. Trifluoroacetic acid and a nitrite salt were identified as essential bath components for a homogeneous etching process. Etch defects could be eliminated by the addition of a decanesulfonate, which stabilizes the SAM resist via a defect healing mechanism.
Burdinski
Dirk
D
Philips Research, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands. dirk.burdinski@philips.com
Brans
Harold J A
HJ
Decré
Michel M J
MM