Near-infrared spectroscopy for monitoring wafer etchant solution using a teflon tube.
Lee
Youngbok
Y
Department of Chemistry, College of Natural Sciences, Hanyang University, Haengdang-Dong, Seongdong-Gu, Seoul, Korea 133-791.
Nah
Sanghee
S
Namkung
Hankyu
H
Chung
Hoeil
H
D045424:Complex Mixtures / Q000032:analysis / Q000737:chemistry; D006858:Hydrofluoric Acid / Q000032:analysis* / Q000737:chemistry; D011138:Polytetrafluoroethylene; D012666:Semiconductors; D012996:Solutions; D012997:Solvents / Q000032:analysis / Q000737:chemistry; D013048:Specimen Handling / Q000295:instrumentation / Q000379:methods*; D017550:Spectroscopy, Fourier Transform Infrared / Q000295:instrumentation / Q000379:methods*; D014867:Water / Q000032:analysis* / Q000737:chemistry
D045424:Complex Mixtures; D012996:Solutions; D012997:Solvents; D014867:Water; D011138:Polytetrafluoroethylene; D006858:Hydrofluoric Acid