Transition of MEMS technology to nanofabrication.
The transition of MEMS technology to nano fabrication is a solution to the growing demand for smaller and high-density feature sizes in the nanometer scale. Nanoimprint lithography (NIL) techniques for fabricating micro- and nano-features are discussed including hot embossing lithography (HEL), UV Molding (UVM) and micro contact printing (microCP). Recent results in micro and nano-pattern transfer are presented where features ranged from < 100 nm to several centimeters. We also present a comparative study between standard glass microfluidic chips and their HEL counterparts by metrology. Hot-embossed microfluidic chips are shown to be faithful replicates of their parent stamps. NIL is presented as a promising avenue for low-cost, high throughput micro and nano-device fabrication.
Luesebrink
Helge
H
EV Group GmbH, DI Erich Thallner Street 1, A-4780 Schaerding, Austria.
Glinsner
Thomas
T
Jakeway
Stephen C
SC
Crabtree
H John
HJ
Cameron
Neil S
NS
Roberge
Hélène
H
Veres
Teodor
T
D004867:Equipment Design / Q000379:methods*; D019544:Equipment Failure Analysis; D008422:Materials Testing; D046210:Microfluidic Analytical Techniques / Q000295:instrumentation* / Q000379:methods / Q000639:trends; D008904:Miniaturization; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure; D036103:Nanotechnology / Q000379:methods* / Q000639:trends; D013499:Surface Properties; D013673:Technology Assessment, Biomedical