title: Transition of MEMS technology to nanofabrication.
abstract: The transition of MEMS technology to nano fabrication is a solution to the growing demand for smaller and high-density feature sizes in the nanometer scale. Nanoimprint lithography (NIL) techniques for fabricating micro- and nano-features are discussed including hot embossing lithography (HEL), UV Molding (UVM) and micro contact printing (microCP). Recent results in micro and nano-pattern transfer are presented where features ranged from < 100 nm to several centimeters. We also present a comparative study between standard glass microfluidic chips and their HEL counterparts by metrology. Hot-embossed microfluidic chips are shown to be faithful replicates of their parent stamps. NIL is presented as a promising avenue for low-cost, high throughput micro and nano-device fabrication.
authors.affiliation: EV Group GmbH, DI Erich Thallner Street 1, A-4780 Schaerding, Austria.
authors.forename: Helge
authors.initials: H
authors.lastname: Luesebrink
authors.forename: Thomas
authors.initials: T
authors.lastname: Glinsner
authors.forename: Stephen C
authors.initials: SC
authors.lastname: Jakeway
authors.forename: H John
authors.initials: HJ
authors.lastname: Crabtree
authors.forename: Neil S
authors.initials: NS
authors.lastname: Cameron
authors.forename: Hélène
authors.initials: H
authors.lastname: Roberge
authors.forename: Teodor
authors.initials: T
authors.lastname: Veres
mesh_terms: D004867:Equipment Design / Q000379:methods*; D019544:Equipment Failure Analysis; D008422:Materials Testing; D046210:Microfluidic Analytical Techniques / Q000295:instrumentation* / Q000379:methods / Q000639:trends; D008904:Miniaturization; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure; D036103:Nanotechnology / Q000379:methods* / Q000639:trends; D013499:Surface Properties; D013673:Technology Assessment, Biomedical