Coating uniformity improvement for a dense-wavelength-division-multiplexing filter by use of the etching effect.
The uniformity of optical narrow-bandpass filters for dense wavelength division multiplexing (DWDM) has been improved by control of the coating parameters of electron guns and the ion source. The optical film was deposited by the electron gun and was etched by the ion source during the ion-assisted deposition process. The uniformity of the coating of a 100 GHz DWDM filter is better than +/- 0.003% over a circular area of 50 mm in diameter when such an etching process is used.
Hsu
Jin-Cherng
JC
Department of Physics, Fu Jen Catholic University, 510 Chung-Cheng Road, Hsinchuang 242, Taiwan. phys2022@mails.fju.edu.tw
Lee
Cheng-Chung
CC
Kuo
Chien-Chung
CC
Chen
Sheng-Hui
SH
Wu
Jean-Yee
JY
Chen
Huang-Lu
HL
Wei
Ching-Yi
CY