title: Multivalent dendrimers at molecular printboards: influence of dendrimer structure on binding strength and stoichiometry and their electrochemically induced desorption.
abstract: A fundamental understanding of multivalency can have a profound influence on bottom-up nanofabrication. For this purpose, three different types of ferrocenyl (Fc) functionalized dendrimers of generations 1-5 with various spacer groups were adsorbed at self-assembled monolayers (SAMs) of heptathioether-functionalized beta-cyclodextrin (betaCD) on gold. The dendrimers formed kinetically stable supramolecular assemblies at the betaCD host surface having up to eight multivalent supramolecular interactions, but could be efficiently removed from the host surface by electrochemical oxidation of the Fc end groups. Dendrimer desorption and re-adsorption could be repeated a number of times without significant decomposition of the system. The stoichiometries of the dendrimers at the surface were determined using cyclic voltammetry (CV). These were quantitatively confirmed for the lower generations by surface plasmon resonance (SPR) titrations of the dendrimers to the betaCD SAM. Measuring CV and SPR simultaneously gave crucial mechanistic information on the electrochemically induced desorption of the dendrimers from the host surface. The redox-active dendrimers effectively blocked the host surface for binding other molecules, e.g. adamantyl-functionalized dendrimers, but electrochemically induced release of the blocking layer revealed the host surface to which the adamantyl dendrimers could then bind.
authors.affiliation: Laboratory of Supramolecular Chemistry and Technology and Strategic Research Orientation "Nanofabrication", MESA Institute for Nanotechnology, University of Twente, P. O. Box 217, 7500 AE, Enschede, The Netherlands.
authors.forename: Christian A
authors.initials: CA
authors.lastname: Nijhuis
authors.forename: Fang
authors.initials: F
authors.lastname: Yu
authors.forename: Wolfgang
authors.initials: W
authors.lastname: Knoll
authors.forename: Jurriaan
authors.initials: J
authors.lastname: Huskens
authors.forename: David N
authors.initials: DN
authors.lastname: Reinhoudt