Toward molecular electronic circuitry: selective deposition of metals on patterned self-assembled monolayer surfaces.
We have developed a simple, robust method by which to construct complex two-dimensional structures based on controlling interfacial chemistry. Our approach is to employ UV-photopatterning and the reaction of vapor-deposited metals with self-assembled monolayers. To demonstrate the method, we have selectively vapor-deposited Mg on a patterned -CH3/-COOH-terminated alkanethiolate surface. The deposited metal penetrates through the -CH3 SAM to the Au/S interface while reacting with and accumulating on top of the -COOH SAM. This work has important applications in molecular/organic electronics, sensing, and other technologies. Our method has many advantages: it is extensible to many different materials, easily parallelized, affords precise nanoscale placement, and is fully compatible with photolithography.
Zhou
Chuanzhen
C
Department of Chemistry and Center for Materials Innovation, Washington University in St. Louis, Campus Box 1134, One Brookings Drive, St. Louis, Missouri 63130, USA.
Nagy
Gabriella
G
Walker
Amy V
AV