Fluorinated organic-inorganic hybrid mold as a new stamp for nanoimprint and soft lithography.
In this paper, we fabricated a fluorinated organic-inorganic hybrid mold using a nonhydrolytic sol-gel process which can produce a crack-free mold without leaving any trace of solvent. No special chemical treatment of a release layer is needed because the fluorinated hybrid mold has fluorine molecules in the backbone. The other advantages of the hybrid mold are thermal stability over 300 degrees C. The hybrid mold produced from UV nanoimprint lithography (UV-NIL) was used as a mold for the next UV-NIL and soft lithography without requiring use of an antisticking layer. Various nanometer scale patterns including sub-100 nm patterns could be obtained from the hybrid mold. Nanopatterning processes using this low-cost mold are useful because they preserve the expensive original master.
Choi
Dae-Geun
DG
Nano-Mechanical Systems Research Center, Korea Institute of Machinery & Materials, 171 Jang-dong, Yuseong-gu, Daejeon, 305-343 Republic of Korea. lamcdg@kimm.re.kr
Jeong
Jun-ho
JH
Sim
Young-suk
YS
Lee
Eung-sug
ES
Kim
Woo-Soo
WS
Bae
Byeong-Soo
BS