title: Residual stresses in thin polymer films cause rupture and dominate early stages of dewetting.
abstract: In attempting to reduce the size of functional devices, the thickness of polymer films has reached values even smaller than the diameter of the unperturbed molecule. However, despite enormous efforts for more than a decade, our understanding of the origin of some puzzling properties of such thin films is still not satisfactory and several peculiar observations remain mysterious. For example, under certain conditions, such films show negative expansion coefficients or show undesirable rupture although energetically they are expected to be stable. Here, we demonstrate that many of these extraordinary effects can be related to residual stresses within the film, resulting from the preparation of these films from solution by fast evaporation of the solvent. Consequently, depending on thermal history and ageing time, such films show significant changes even in the glassy state, which we quantify by dewetting experiments and corresponding theoretical studies. Identifying the relevance of frozen-in polymer conformations gives us a handle for manipulating and controlling properties of nanometric thin polymer films.
authors.affiliation: Institut de Chimie des Surfaces et Interfaces, CNRS-UHA, 15, rue Jean Starcky, BP 2488, 68057 Mulhouse Cedex, France. g.reiter@uha.fr
authors.forename: Günter
authors.initials: G
authors.lastname: Reiter
authors.forename: Moustafa
authors.initials: M
authors.lastname: Hamieh
authors.forename: Pascal
authors.initials: P
authors.lastname: Damman
authors.forename: Séverine
authors.initials: S
authors.lastname: Sclavons
authors.forename: Sylvain
authors.initials: S
authors.lastname: Gabriele
authors.forename: Thomas
authors.initials: T
authors.lastname: Vilmin
authors.forename: Elie
authors.initials: E
authors.lastname: Raphaël
mesh_terms: D000327:Adsorption; D003460:Crystallization / Q000379:methods*; D004129:Dimethylpolysiloxanes / Q000032:analysis / Q000737:chemistry*; D006244:Hardness; D008422:Materials Testing; D008567:Membranes, Artificial; D008968:Molecular Conformation; D049329:Nanostructures / Q000032:analysis / Q000737:chemistry* / Q000648:ultrastructure*; D011137:Polystyrenes / Q000032:analysis / Q000737:chemistry*; D012828:Silicones / Q000032:analysis / Q000737:chemistry*; D013314:Stress, Mechanical; D017155:Wettability
chemical_list: D004129:Dimethylpolysiloxanes; D008567:Membranes, Artificial; D011137:Polystyrenes; D012828:Silicones; C013830:baysilon