title: Retroscleral implantation technique for porous polyethylene orbital implant after evisceration.
abstract: The authors developed a technique for the retroscleral implantation of a porous polyethylene orbital implant after evisceration for the placement of an adequately large orbital implant without wound tension. The surgical results of the technique in 27 patients are reported. The technique involves the severance of the optic nerve after standard evisceration and the insertion of the orbital implant into the retroscleral and intraconal space through the side of the scleral shell. All patients received a 20-mm orbital implant. No complications such as infection, implant exposure, or worsened implant motility were observed during the average follow-up period of 22.4 months. Retroscleral implantation of the orbital implant after evisceration may be an appropriate procedure that allows placement of a large orbital implant without exposure or decreased implant motility.
authors.affiliation: Department of Ophthalmology, Seoul National University College of Medicine, Seoul, Korea.
authors.forename: Ho-Kyung
authors.initials: HK
authors.lastname: Choung
authors.forename: Soo Kyung
authors.initials: SK
authors.lastname: Han
authors.forename: Sang In
authors.initials: SI
authors.lastname: Khwarg
mesh_terms: D000293:Adolescent; D000328:Adult; D002648:Child; D017234:Eye Evisceration; D005260:Female; D006801:Humans; D008297:Male; D008875:Middle Aged; D020273:Orbital Implants; D020959:Polyethylene; D016062:Porosity; D019919:Prosthesis Implantation / Q000379:methods*; D012189:Retrospective Studies; D012590:Sclera
chemical_list: D020959:Polyethylene