Effect of applied potential on arylmethyl films oxidatively grafted to carbon surfaces.
Arylmethyl films have been grafted to glassy carbon surfaces and to pyrolyzed photoresist films (PPFs) by electrochemical oxidation of 1-naphthylmethylcarboxylate and 4-methoxybenzylcarboxylate. Atomic force microscopy (AFM) and electrochemistry were used to characterize the as-prepared films and to monitor changes induced by post-preparation treatments. Film thickness was measured by depth profiling using an AFM tip to remove film from the PPF surface. Surface coverage of electroactive modifiers was estimated from cyclic voltammetry, and monitoring the response of a solution-based redox probe at grafted surfaces gave a qualitative indication of changes in film properties. For preparation of the films, the maximum film thickness increased with the potential applied during grafting, and all films were of multilayer thickness. The apparent rate of electron transfer for the Fe(CN)(6)3-/Fe(CN)(6)4- couple was very low at as-prepared films. After film-grafted electrodes were transferred to pure acetonitrile-electrolyte solution and subjected to negative potential excursions, the response of the Fe(CN)(6)3-/Fe(CN)(6)4- couple changed and was consistent with faster electron-transfer kinetics, the film thickness decreased and the surface roughness increased substantially. Applying a positive potential to the treated film reversed changes in film thickness, but the voltammetric response of the Fe(CN)(6)3-/Fe(CN)(6)4- couple remained kinetically fast. After as-prepared films were subjected to positive applied potentials in acetonitrile-electrolyte solution, the apparent rate of electron transfer for the Fe(CN)(6)3-/Fe(CN)(6)4- couple remained very slow and the measured film thickness was the same or greater than that before treatment at positive potentials. Mechanisms are considered to explain the observed effects of applied potential on film characteristics.
Brooksby
Paula A
PA
MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Chemistry, University of Canterbury, Private Bag 4800, Christchurch, New Zealand.
Downard
Alison J
AJ
Yu
Samuel S C
SS