Fabrication of metallic nanodots in large-area arrays by mold-to-mold cross imprinting (MTMCI).
We have developed a mold-to-mold cross imprint (MTMCI) process, which redefines an imprint mold with another imprint mold. By performing MTMCI on two identical imprint molds with silicon spacer nanowires in a perpendicular arrangement, we fabricated a large array of sub-30-nm silicon nanopillars. Large-area arrays of Pt dots are then produced using nanoimprint lithography with the silicon nanopillar mold.
Kwon
Sunghoon
S
The Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA.
Yan
Xiaoming
X
Contreras
Anthony M
AM
Liddle
J Alexander
JA
Somorjai
Gabor A
GA
Bokor
Jeffrey
J
D003460:Crystallization / Q000379:methods*; D008422:Materials Testing; D036103:Nanotechnology / Q000379:methods*; D043942:Nanotubes / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D012825:Silicon / Q000737:chemistry*; D012822:Silicon Dioxide / Q000737:chemistry*
D012822:Silicon Dioxide; D012825:Silicon