Fabrication and characterization of stable ultrathin film micropatterns containing DNA and photosensitive polymer diazoresin.
Stable, ultrathin DNA micropatterns were fabricated from photosensitive polymer diazoresin (DR) through a self-assembly technique. The micropatterns were achieved on LBL ultrathin film after UV exposure through a photomask. The patterns were characterized systematically with scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy and fluorescence microscopy. All of the results indicate that the combined LBL self-assembly and photolithography technique is a promising method for constructing stable, well-defined micropatterns with a nanoscale thickness.
Yu
Bing
B
The Key Lab of Bioorganic Chemistry and Molecular Engineering of Ministry of Education, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People's Republic of China.
Cong
Hai-Lin
HL
Liu
Hu-Wei
HW
Lu
Cong-Hua
CH
Wei
Fang
F
Cao
Wei-Xiao
WX
D000818:Animals; D001391:Azo Compounds / Q000737:chemistry*; D004247:DNA / Q000737:chemistry* / Q000648:ultrastructure; D005399:Fishes; D008297:Male; D018625:Microscopy, Atomic Force; D008855:Microscopy, Electron, Scanning; D015394:Molecular Structure; D010777:Photochemistry; D011108:Polymers / Q000737:chemistry*; D013057:Spectrum Analysis; D013094:Spermatozoa / Q000737:chemistry / Q000528:radiation effects / Q000648:ultrastructure
D001391:Azo Compounds; D011108:Polymers; C504851:diazoresin; D004247:DNA