title: Fabrication of metallic nanodots in large-area arrays by mold-to-mold cross imprinting (MTMCI).
abstract: We have developed a mold-to-mold cross imprint (MTMCI) process, which redefines an imprint mold with another imprint mold. By performing MTMCI on two identical imprint molds with silicon spacer nanowires in a perpendicular arrangement, we fabricated a large array of sub-30-nm silicon nanopillars. Large-area arrays of Pt dots are then produced using nanoimprint lithography with the silicon nanopillar mold.
authors.affiliation: The Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA.
authors.forename: Sunghoon
authors.initials: S
authors.lastname: Kwon
authors.forename: Xiaoming
authors.initials: X
authors.lastname: Yan
authors.forename: Anthony M
authors.initials: AM
authors.lastname: Contreras
authors.forename: J Alexander
authors.initials: JA
authors.lastname: Liddle
authors.forename: Gabor A
authors.initials: GA
authors.lastname: Somorjai
authors.forename: Jeffrey
authors.initials: J
authors.lastname: Bokor
mesh_terms: D003460:Crystallization / Q000379:methods*; D008422:Materials Testing; D036103:Nanotechnology / Q000379:methods*; D043942:Nanotubes / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D012825:Silicon / Q000737:chemistry*; D012822:Silicon Dioxide / Q000737:chemistry*
chemical_list: D012822:Silicon Dioxide; D012825:Silicon