Fabrication of biological nanostructures by scanning near-field photolithography of chloromethylphenylsiloxane monolayers.
We demonstrate the fabrication of sub-100-nm DNA surface patterns by scanning near-field optical lithography using a near-field scanning optical microscope coupled to a UV laser and a chloromethylphenylsiloxane (CMPS) self-assembled monolayer (SAM). The process involves 244-nm exposure of the CMPS SAM to create nanoscale patterns of surface carboxylic acid functional groups, followed by their conversion to the N-hydroxysuccinimidyl ester and reaction of the active ester with DNA to spatially control DNA grafting with high selectivity.
Sun
Shuqing
S
Department of Chemistry, University of Sheffield, UK.
Montague
Matthew
M
Critchley
Kevin
K
Chen
Mu-San
MS
Dressick
Walter J
WJ
Evans
Stephen D
SD
Leggett
Graham J
GJ
D000818:Animals; D002264:Carboxylic Acids / Q000737:chemistry; D002417:Cattle; D004247:DNA / Q000737:chemistry*; D007834:Lasers; D018625:Microscopy, Atomic Force; D049329:Nanostructures; D012833:Siloxanes / Q000737:chemistry*; D013388:Succinimides / Q000737:chemistry; D013499:Surface Properties
D002264:Carboxylic Acids; D012833:Siloxanes; D013388:Succinimides; D004247:DNA; C427203:calf thymus DNA