title: Kinetic Monte Carlo simulations of nucleation and growth in electrodeposition.
abstract: Nucleation and growth during bulk electrodeposition is studied using kinetic Monte Carlo (KMC) simulations. Ion transport in solution is modeled using Brownian dynamics, and the kinetics of nucleation and growth are dependent on the probabilities of metal-on-substrate and metal-on-metal deposition. Using this approach, we make no assumptions about the nucleation rate, island density, or island distribution. The influence of the attachment probabilities and concentration on the time-dependent island density and current transients is reported. Various models have been assessed by recovering the nucleation rate and island density from the current-time transients.
authors.affiliation: Department of Materials Science and Engineering, Johns Hopkins University, Baltimore, Maryland 21218, USA.
authors.forename: Lian
authors.initials: L
authors.lastname: Guo
authors.forename: Aleksandar
authors.initials: A
authors.lastname: Radisic
authors.forename: Peter C
authors.initials: PC
authors.lastname: Searson