title: Genotoxicity of dental resin polymerization initiators in vitro.
abstract: The polymerization initiators for resins cured using visible light usually consist of a photosensitizer, primarily camphorquinone (CQ), and a reducing agent, which is often a tertiary amine (DMPT, DMAEMA), while the initiator used for self-curing resins consists of benzoyl peroxide (BPO) and a tertiary amine (DMPT). The genotoxicities of camphorquinone (CQ), benzoyl peroxide (BPO), dimethyl-para-toluidine (DMPT), 2-dimethylamino-ethyl-methacrylate (DMAEMA), and 1-allyl-2-thiourea (ATU) were examined using the bioluminescent bacterial genotoxicity test. 4-Nitroquinoline-N-oxide (4NQO) was prepared for comparison with these chemicals. Acetone solutions of the five polymerization initiators and 4NQO were prepared. Benzoyl peroxide (BPO), dimethyl-para-toluidine (DMPT), and 1-allyl-2-thiourea (ATU) showed significant genotoxic activity at 24 h in the bioluminescent bacterial genotoxicity test, at concentrations of approximately 5 microM, 4 mM, and 1 mM, respectively. 2-Dimethyloamino-ethyl-methacrylate (DMAEMA) did not have genotoxic activity and CQ had questionable genotoxic activity. In comparison, 4NQO had strong genotoxicity, at 4 microM, roughly the same as that of BPO. Therefore, BPO should be used carefully in clinical dentistry.
authors.affiliation: Department of Biomaterials Science, Graduate School of Biomedical Sciences, Hiroshima University, Hiroshima, Japan. ynomura@hiroshima-u.ac.jp
authors.forename: Y
authors.initials: Y
authors.lastname: Nomura
authors.forename: W
authors.initials: W
authors.lastname: Teshima
authors.forename: T
authors.initials: T
authors.lastname: Kawahara
authors.forename: N
authors.initials: N
authors.lastname: Tanaka
authors.forename: H
authors.initials: H
authors.lastname: Ishibashi
authors.forename: M
authors.initials: M
authors.lastname: Okazaki
authors.forename: K
authors.initials: K
authors.lastname: Arizono
mesh_terms: D015112:4-Nitroquinoline-1-oxide / Q000737:chemistry / Q000633:toxicity; D000096:Acetone / Q000737:chemistry; D001585:Benzoyl Peroxide / Q000737:chemistry / Q000633:toxicity; D001672:Biocompatible Materials / Q000737:chemistry / Q000633:toxicity*; D002164:Camphor / Q000031:analogs & derivatives / Q000737:chemistry / Q000633:toxicity; D003188:Composite Resins / Q000633:toxicity*; D003764:Dental Materials / Q000633:toxicity*; D004305:Dose-Response Relationship, Drug; D005021:Ethylamines / Q000737:chemistry / Q000633:toxicity; D066298:In Vitro Techniques; D020128:Inhibitory Concentration 50; D008027:Light; D008689:Methacrylates / Q000737:chemistry / Q000633:toxicity; D015394:Molecular Structure; D009152:Mutagenicity Tests; D017319:Photosensitizing Agents / Q000633:toxicity; D015363:Quinolones / Q000737:chemistry / Q000633:toxicity; D019163:Reducing Agents / Q000737:chemistry / Q000633:toxicity; D012996:Solutions / Q000737:chemistry; D013452:Sulfonium Compounds / Q000633:toxicity; D013890:Thiourea / Q000031:analogs & derivatives / Q000737:chemistry / Q000633:toxicity; D014052:Toluidines / Q000737:chemistry / Q000633:toxicity
chemical_list: C510335:2-dimethylaminoethyl methacrylate; C120195:4-nitroquinolone-1-oxide; D001672:Biocompatible Materials; D003188:Composite Resins; D003764:Dental Materials; D005021:Ethylamines; D008689:Methacrylates; D017319:Photosensitizing Agents; D015363:Quinolones; D019163:Reducing Agents; D012996:Solutions; D013452:Sulfonium Compounds; D014052:Toluidines; D000096:Acetone; D015112:4-Nitroquinoline-1-oxide; D002164:Camphor; C068078:dimethylpropiothetin; D013890:Thiourea; C015835:dimethyl-4-toluidine; D001585:Benzoyl Peroxide