Substrates for direct imaging of chemically functionalized SiO2 surfaces by transmission electron microscopy.
A significant challenge in materials characterization is the determination of the structure of nanoparticle assemblies that have been deposited on solid substrates, such as SiO2. The best method for obtaining quantitative information about structure, size, and spacing on the nanometer-length scale is TEM; however, commercially available TEM grids offer a limited range of substrate materials. In addition, the compositions of these grids do not permit much chemical processing. Here we describe silicon-based grids with electron-transparent SiO2 windows suitable for use as substrates for high-resolution TEM that can be easily fabricated using standard silicon microfabrication techniques. These grids are physically and chemically robust and exhibit the same surface chemistry and chemical stability as an oxide grown on a silicon wafer. Thus, the grids make possible the concurrent investigation of chemical and structural information on the same sample. Convenient modification of the surfaces of the grids provides access to a wide range of new substrates for the direct imaging of chemically modified surfaces by TEM. We demonstrate the utility of these grids by aligning DNA on the chemically modified SiO2 surface in order to direct the assembly of linear arrays of nanoparticles. Using these grids, we are able to quantify the effects of assembly conditions on nanoparticle size, spacing, and dispersity in the arrays.
Kearns
Gregory J
GJ
Department of Chemistry and Materials Science Institute, University of Oregon, Eugene, Oregon 97403, USA.
Foster
Evan W
EW
Hutchison
James E
JE
D004247:DNA / Q000737:chemistry*; D046529:Microscopy, Electron, Transmission; D053758:Nanoparticles / Q000737:chemistry*; D036103:Nanotechnology; D012822:Silicon Dioxide / Q000737:chemistry*; D013499:Surface Properties
D012822:Silicon Dioxide; D004247:DNA