title: Photolithographic patterning of dendrimer monolayers and pattern-selective adsorption of linear macromolecules.
abstract: Alkyl groups of n-octadecyltrimethoxysilane (ODS) in a self-assembled monolayer on a silicon substrate were oxidized to carboxyl groups by partial irradiation of vacuum ultra-violet light under the photomask, producing a COOH/ODS line pattern. After active esterification of carboxyl groups, two kinds of amine-terminated dendrimers, poly(propyleneimine) and poly(amido amine) (PAMAM) dendrimers, were immobilized on a COOH line through amide-bond so that photolithographic dendrimer/ODS pattern was finally fabricated. Preparation was certified by atomic force microscopy (AFM) and surface-enhanced infrared absorption spectroscopy at transmission mode. Adsorption of linear macromolecules was examined on PAMAM dendrimer/ODS pattern. After adsorption of poly-L-glutamic acid (PGA) at a pH below alpha-helix--random coil transition, rod-shape texture was observed only on the dendrimer line in an AFM image. This texture is an aggregate of alpha-helical PGA. Sodium hyaluronate and DNA were also adsorbed selectively on the dendrimer line, keeping the line profile, although characteristic textures were not observed.
authors.affiliation: Graduate School of Science, Nagoya University, Chikusa, Nagoya 464-8602, Japan.
authors.forename: Tomoko
authors.initials: T
authors.lastname: Yamazaki
authors.forename: Toyoko
authors.initials: T
authors.lastname: Imae
authors.forename: Hiroyuki
authors.initials: H
authors.lastname: Sugimura
authors.forename: Nagahiro
authors.initials: N
authors.lastname: Saito
authors.forename: Kazuyuki
authors.initials: K
authors.lastname: Hayashi
authors.forename: Osamu
authors.initials: O
authors.lastname: Takai
mesh_terms: D000327:Adsorption; D000588:Amines / Q000737:chemistry; D001672:Biocompatible Materials / Q000737:chemistry; D004247:DNA / Q000737:chemistry; D050091:Dendrimers; D004563:Electrochemistry; D006820:Hyaluronic Acid / Q000737:chemistry; D006860:Hydrogen Bonding; D006863:Hydrogen-Ion Concentration; D046911:Macromolecular Substances / Q000737:chemistry; D018625:Microscopy, Atomic Force; D009690:Nucleic Acid Conformation; D017646:Organosilicon Compounds / Q000737:chemistry*; D011073:Polyamines / Q000737:chemistry; D011099:Polyglutamic Acid / Q000737:chemistry; D011108:Polymers / Q000737:chemistry; D012825:Silicon / Q000737:chemistry; D013053:Spectrophotometry; D013499:Surface Properties; D014466:Ultraviolet Rays
chemical_list: D000588:Amines; D001672:Biocompatible Materials; D050091:Dendrimers; D046911:Macromolecular Substances; D017646:Organosilicon Compounds; C104700:PAMAM Starburst; D011073:Polyamines; D011108:Polymers; D011099:Polyglutamic Acid; C102207:n-octadecyltrimethoxysilane; D006820:Hyaluronic Acid; D004247:DNA; D012825:Silicon