title: Optimization of anisotropically etched silicon surface-relief gratings for substrate-mode optical interconnects.
abstract: The optimum profiles of right-angle-face anisotropically etched silicon surface-relief gratings illuminated at normal incidence for substrate-mode optical interconnects are determined for TE, TM, and random linear (RL) polarizations. A simulated annealing algorithm in conjunction with the rigorous coupled-wave analysis is used. The optimum diffraction efficiencies of the -1 forward-diffracted order are 37.3%, 67.1%, and 51.2% for TE-, TM-, and RL-polarization-optimized profiles, respectively. Also, the sensitivities to grating thickness, slant angle, and incident angle of the optimized profiles are presented.
authors.affiliation: School of Electrical and Computer Engineering, Microelectronics Research Center, Georgia Institute of Technology, Atlanta, Georgia 30332, USA. gte782q@gmail.com
authors.forename: Shun-Der
authors.initials: SD
authors.lastname: Wu
authors.forename: Thomas K
authors.initials: TK
authors.lastname: Gaylord
authors.forename: Jonathan S
authors.initials: JS
authors.lastname: Maikisch
authors.forename: Elias N
authors.initials: EN
authors.lastname: Glytsis