title: Systematic investigation of the formation of 1D alpha-Si(3)N(4) nanostructures by using a thermal-decomposition/nitridation process.
abstract: This article describes a simple thermal-decomposition/nitridation method for the large-scale synthesis of 1D alpha-Si(3)N(4) nanostructures, such as millimeter-scale microribbons, nanosaws, nanoribbons, and nanowires. These nanostructures are systematically investigated by checking the product deposited at different areas by using powder X-ray diffraction, scanning electron microscopy, transmission electron microscopy, and electron energy loss spectroscopy. Studies show that all these nanostructures have a single-crystalline nature and predominantely grow along the [011] direction. These 1D nanostructures are formed by thermal decomposition, followed by the nitridation of SiO.
authors.affiliation: Advanced Materials Laboratory, National Institute for Materials Science (NIMS), Namiki 1-1, Tsukuba, Ibaraki 305-0044, Japan. shen.guozhen@nims.go.jp
authors.forename: Guozhen
authors.initials: G
authors.lastname: Shen
authors.forename: Yoshio
authors.initials: Y
authors.lastname: Bando
authors.forename: Baodan
authors.initials: B
authors.lastname: Liu
authors.forename: Chengchun
authors.initials: C
authors.lastname: Tang
authors.forename: Qing
authors.initials: Q
authors.lastname: Huang
authors.forename: Dmitri
authors.initials: D
authors.lastname: Golberg