title: Capacitive micromachined ultrasonic transducers: fabrication technology.
abstract: Capacitive micromachined ultrasonic transducer (cMUT) technology is a prime candidate for next generation imaging systems. Medical and underwater imaging and the nondestructive evaluation (NDE) societies have expressed growing interest in cMUTs over the years. Capacitive micromachined ultrasonic transducer technology is expected to make a strong impact on imaging technologies, especially volumetric imaging, and to appear in commercial products in the near future. This paper focuses on fabrication technologies for cMUTs and reviews and compares variations in the production processes. We have developed two main approaches to the fabrication of cMUTs: the sacrificial release process and the recently introduced wafer-bonding method. This paper gives a thorough review of the sacrificial release processes, and it describes the new wafer-bonding method in detail. Process variations are compared qualitatively and quantitatively whenever possible. Through these comparisons, it was concluded that wafer-bonded cMUT technology was superior in terms of process control, yield, and uniformity. Because the number of steps and consequent process time were reduced (from six-mask process to four-mask process), turn-around time was improved significantly.
authors.affiliation: Edward L. Ginzton Laboratory, Stanford University, Stanford, CA 94305-4088, USA. sanli@stanford.edu
authors.forename: Arif Sanli
authors.initials: AS
authors.lastname: Ergun
authors.forename: Yongli
authors.initials: Y
authors.lastname: Huang
authors.forename: Xuefeng
authors.initials: X
authors.lastname: Zhuang
authors.forename: Omer
authors.initials: O
authors.lastname: Oralkan
authors.forename: Goksen G
authors.initials: GG
authors.lastname: Yaralioglu
authors.forename: Butrus T
authors.initials: BT
authors.lastname: Khuri-Yakub
mesh_terms: D001709:Biotechnology / Q000295:instrumentation* / Q000379:methods; D025802:Electric Capacitance; D004582:Electronics, Medical; D004867:Equipment Design / Q000379:methods; D019544:Equipment Failure Analysis; D008567:Membranes, Artificial; D008839:Microelectrodes; D008904:Miniaturization; D014159:Transducers; D014463:Ultrasonography / Q000295:instrumentation* / Q000379:methods
chemical_list: D008567:Membranes, Artificial