Low-loss one-dimensional photonic bandgap filter in (110) silicon.
A free-space silicon one-dimensional photonic bandgap optical filter is designed and fabricated. A two-stage (110) wafer etching process is employed to form the extremely vertical, smooth, and high-aspect-ratio features that are essential for good optical properties. The (111) oriented planes of the wafer form <0.01 degrees off-vertical trenches that make up the Fabry-Perot filter. A simulation model is presented that analyzes the effect of verticality and predicts the measured spectrum well.
Optical and Semiconductor Devices Group, Department of Electrical and Electronic Engineers, Imperial College London, UK.
Ariel
A
Lipson
Eric M
EM
Yeatman