Integrated optical filter arrays fabricated by using the combinatorial etching technique.
A combinatorial etching technique is developed to fabricate integrated narrow bandpass filters on a single substrate. It is highly efficient for fabrication of integrated filter arrays in optical regions. A monolithic filter array has been fabricated by using the technique with a two-step deposition process. The filter contains 32 elements in the near-infrared region. The relative full width at half-maximum (FWHM) sigmalambda/lambda of the filter elements is less than 0.2%. Such a narrow bandpass filter array can be utilized in many optical applications.
Wang
Shao-Wei
SW
National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, China. wangshw@mail.sitp.ac.cn
Chen
Xiaoshuang
X
Lu
Wei
W
Wang
Li
L
Wu
Yonggang
Y
Wang
Zhanshan
Z