title: Automatic procedure for aberration compensation in digital holographic microscopy and applications to specimen shape compensation.
abstract: We present a procedure that compensates for phase aberrations in digital holographic microscopy by computing a polynomial phase mask directly from the hologram. The phase-mask parameters are computed automatically without knowledge of physical values such as wave vectors, focal lengths, or distances. This method enables one to reconstruct correct and accurate phase distributions, even in the presence of strong and high-order aberrations. Examples of applications are shown for microlens imaging and for compensating for the deformations associated with a tilted thick plate. Finally we show that this method allows compensation for the curvature of the specimen, revealing its surface defects and roughness. Examples of applications are shown for microlenses and metallic sphere imaging.
authors.affiliation: Ecole Polytechnique Fédérale de Lausanne (EPFL), Imaging and Applied Optics Institute, CH-1015 Lausanne, Switzerland. tristan.colomb@a3.epfl.ch
authors.forename: Tristan
authors.initials: T
authors.lastname: Colomb
authors.forename: Etienne
authors.initials: E
authors.lastname: Cuche
authors.forename: Florian
authors.initials: F
authors.lastname: Charrière
authors.forename: Jonas
authors.initials: J
authors.lastname: Kühn
authors.forename: Nicolas
authors.initials: N
authors.lastname: Aspert
authors.forename: Frédéric
authors.initials: F
authors.lastname: Montfort
authors.forename: Pierre
authors.initials: P
authors.lastname: Marquet
authors.forename: Christian
authors.initials: C
authors.lastname: Depeursinge